1.

Conference Proceedings
Conference Proceedings
1. Improved modeling of fogging and loading effect correction [5992-165]
Lee, S. ; Kim, B. ; Han, H. ; Nam, D. ; Moon, S. ; Choi, S. ; Han, W.
Pub. info.: 25th Annual BACUS Symposium on Photomask Technology.  pp.59924U-,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5992
2.

Conference Proceedings
Conference Proceedings
2. Study of the beam blur and its effect on the future mask fabrication [6349-33]
Lee, S. ; Park, S. ; Ahn, M. ; Doh, J. ; Kim, S. ; Kim, B. ; Choi, S. ; Han, W.
Pub. info.: Photomask Technology 2006.  pp.63490X-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
3.

Conference Proceedings
Conference Proceedings
3. Study of higher electron beam energy for the mask production for 30 nm node technology [6283-06]
Lee, S. ; Park, S. ; Kim, B. ; Choi, S. ; Han, W.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.628308-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
4.

Conference Proceedings
Conference Proceedings
4. Required mask specification for mass production devices below 65-nm design node [6349-81]
Nam, D. ; Choi, S. ; Doh, J. ; Noh, Y. ; Lee, H. ; Sin, Y. ; Kim, B. ; Kang, M. ; Han, W.
Pub. info.: Photomask Technology 2006.  pp.634928-634928,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349