1.

Conference Proceedings
Conference Proceedings
1. Impact of subwavelength CD tolerance of device performance
Balasinski, A. ; Karklin, L. ; Axelrad, V.
Pub. info.: Design, process integration, and characterization for microelectronics : 6-7 March 2002, Santa Clara, USA.  pp.361-368,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4692
2.

Conference Proceedings
Conference Proceedings
2. Novel procedure for mask disposition electrical signatures of mask defects
Balasinski, A. ; Iandolo, W. ; Ray, O. ; Karklin, L. ; Axelrad, V.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.606-613,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
3.

Conference Proceedings
Conference Proceedings
3. Subwavelength lithography: an impact of photomask errors on cricuit performance
Karklin, L. ; Mazor, S. ; Joshi, D. ; Balasinski, A. ; Axelrad, V.
Pub. info.: Optical Microlithography XV.  Part One  pp.259-267,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691