High-index optical materials for 193-nm immersion Iithogrqphy [6154-45]
- Author(s):
Burnett, J. H. ( National Institute of Standards and Technology (USA) ) Kaplan, S. G. ( National Institute of Standards and Technology (USA) ) Shirley, E. L. ( National Institute of Standards and Technology (USA) ) Horowitz, D. ( National Institute of Standards and Technology (USA) ) Clauss, W. ( Carl-Zeiss SMT AG (Germany) ) Grenville, A. ( SEMATECH (USA) and Intel Corp. (USA) ) Van Peski, C. ( SEMATECH (USA) ) - Publication title:
- Optical Microlithography XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6154
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 615418
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461971 [0819461970]
- Language:
- English
- Call no.:
- P63600/6154
- Type:
- Conference Proceedings
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