1.

Conference Proceedings
Conference Proceedings
1. Differences in pattern displacement error under different illumination conditions
Seong,N.-G. ; Kye,J.-W. ; Kang,H.-Y. ; Moon,J.-T.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.868-872,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
2.

Conference Proceedings
Conference Proceedings
2. Evaluation of phase-edge phase-shifting mask for sub-0.18-ｦﾌm gate patterns in logic devices
Cha,D.-H. ; Kye,J.-W. ; Seong,N.-G. ; Kang,H.-Y. ; Cho,H.-K. ; Moon,J.-T.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.46-54,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
3.

Conference Proceedings
Conference Proceedings
3. Defect inspection and printability of deep-UV halftone phase-shifting mask
Kim,H.-J. ; Hong,J.-S. ; Kye,J.-W. ; Cha,D.-H. ; Kang,H.-Y. ; Moon,J.-T.
Pub. info.: 17th Annual BACUS Symposium on Photomask Technology and Management.  pp.430-440,  1998.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3236