1.

Conference Proceedings
Conference Proceedings
1. Optical proximity correction of bit line pattern in DRAM devices
Kim,Y.-B. ; Sohn,C.-J. ; Kang,H.-Y. ; Han,W.-S. ; Koh,Y.-B.
Pub. info.: Optical Microlithography IX.  Part2  pp.670-679,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726
2.

Conference Proceedings
Conference Proceedings
2. Swing curve characteristics of halftone PSM with off-axis illumination for i-line lithography
Choi,Y.-S. ; Kang,H.-Y. ; Han,W.-S. ; Koh,Y.-B.
Pub. info.: Optical Microlithography IX.  Part2  pp.508-515,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726
3.

Conference Proceedings
Conference Proceedings
3. Application of alternating phase-shifting masks to sub-quarter-micrometer contact holes
Lim,S.-C. ; Kye,J.-W. ; Woo,S.-G. ; Kim,S.-G. ; Kang,H.-Y. ; Han,W.-S. ; Koh,Y.-B.
Pub. info.: Optical Microlithography IX.  Part2  pp.516-523,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2726
4.

Conference Proceedings
Conference Proceedings
4. Fabrication of dense contact patterns using halftone phase-shifting mask with off-axis illumination
Kim,H.-J. ; Kye,J.-W. ; Lee,D.-Y. ; Woo,S.-G. ; Kang,H.-Y. ; Koh,Y.-B.
Pub. info.: Photomask and X-Ray Mask Technology III.  pp.106-114,  1996.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 2793