Application of photosensitive BARC and KrF resist on implant layers
- Author(s):
Owe-Yang, D.C. ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Ho, B.- ( Taiwan Semiconductor Manufacturing Co., Ltd. (Taiwan) ) Miyazaki, S. ( Clariant (Japan) K.K. (Japan) ) Katayama, T. ( Clariant (Japan) K.K. (Japan) ) Susukida, K. ( Clariant (Japan) K.K. (Japan) ) Kang, W. ( Clariant (Japan) K.K. (Japan) ) Chang, Y.-C. ( Clariant Taiwan Co., Ltd. (Taiwan) ) - Publication title:
- Advances in Resist Technology and Processing XXI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5376
- Pub. Year:
- 2004
- Page(from):
- 452
- Page(to):
- 460
- Pages:
- 9
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819452894 [0819452890]
- Language:
- English
- Call no.:
- P63600/5376.1
- Type:
- Conference Proceedings
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