Dissolution fundamentals of 193-nm methacrylate-based photoresists [6153-37]
- Author(s):
Rao, A. ( National Institute of Standards and Technology (USA) ) Kang, S. ( National Institute of Standards and Technology (USA) ) Vogt, B. D. ( National Institute of Standards and Technology (USA) ) Prabhu, V. M. ( National Institute of Standards and Technology (USA) ) Lin, E.K. ( National Institute of Standards and Technology (USA) ) Wu, W.L. ( National Institute of Standards and Technology (USA) ) Turnquest, K. ( SEMATECH Inc. (USA) ) Hinsberg,W.D ( IBM Almaden Research Ctr. (USA) ) - Publication title:
- Advances in Resist Technology and Processing XXIII
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6153
- Pub. Year:
- 2006
- Pt.:
- 1
- Page(from):
- 615310
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461964 [0819461962]
- Language:
- English
- Call no.:
- P63600/6153
- Type:
- Conference Proceedings
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