Dielectric Properties of (ZrxTi₁₋x)O₂ Film on Ru/Si0₂/Si Substrates Deposited by the Atomic Layer Deposition Using [Zr(OtBu)₄ + Ti(OtBu)₄] Cocktail Source

Dielectric Properties of (ZrxTi₁₋x)O₂ Film on Ru/Si0₂/Si Substrates Deposited by the Atomic Layer Deposition Using [Zr(OtBu)₄ + Ti(OtBu)₄] Cocktail Source

Author(s):

J. Lim

Publication title:

Physics and technology of high-k gate dielectrics III

Title of ser.:

ECS transactions

Ser. no.:

1(5)

Pub. Year:

2006

Page(from):

153

Page(to):

160

Pages:

8

Pub. info.:

Pennington, N.J.: Electrochemical Society

ISSN:

19385862

ISBN:

9781566774444 [1566774446]

Language:

English

Call no.:

E23400/1-5

Type:

Conference Proceedings

Details

TDL ID:	ZA00047099
Series ID:	PA00000034
Conf. info. (Name):	International Symposium on High Dielectric Constant Materials: Materials Science, Processing, Reliability, and Manufacturing Issues
Conf. info. (Number):	3rd
Conf. info. (Venue):	Los Angeles, California, USA
Conf. info. (Date):	2005.10.16-2005.10.21

Similar Items:

1 Conference Proceedings Low-k SiBN (Silicon Boron Nitride) Film Synthesized by a Plasma-Assisted Atomic Layer Deposition S. Yang, J. Kim, J. Noh, H. Kim, S. Lee, J. Ahn, K. Hwang, Y. Shin, U. Chung, J. Moon, D. Lee, I. Yi, R. Jung, S. Kang Electrochemical Society	7 Conference Proceedings Biomimetic Deposition of Apatite on Zr-1Nb and Ti-6Al-4V J. Kim, Y.C. Choi, H.S. Kim, S.I. Hong Trans Tech Publications
2 Conference Proceedings Electrical Properties of Atomic-Layer-Deposited La2O3/Thermal-Nitrided SiO2 Stacking Dielectric on 4H-SiC(0001) J.H. Moon, K.Y. Cheong, D.I. Eom, H.K. Song, J.H. Yim, J.H. Lee, H.J. Na, W. Bahng, N.K. Kim, H.J. Kim Trans Tech Publications	8 Conference Proceedings (217ds) Crystallinity of the Atomic Layer Deposited Tiox Thin Films Do-Heyoung Kim, Hyun-Soo Cho American Institute of Chemical Engineers
3 Conference Proceedings Evaluation of Novel Sr Precursors for Atomic Layer Deposition of SrO Thin Film K. Kim, K. Cho, K. Lee, Y. Kim, J.H. Choi Electrochemical Society	9 Conference Proceedings Crystallization of Amorphous Si Thin Films Using Sub-nm Nickel Oxide Thin Layers Deposited by Atomic Layer Deposition B. So, W. Cho, Y. You, J. Hwang, S. Lee Electrochemical Society
4 Conference Proceedings The Improvement in Dielectric Characteristics and Reliability of Atomic-Layer-Deposited HfO₂ Thin Films by In-Situ NH₃ Injection J. Kim, T. Park, M. Cho, M. Seo, J. Jang, C. Hwang Electrochemical Society	10 Conference Proceedings Atomic Layer Deposition of Ru by Using a New Ru-Precursor J. Lee, Y. Song, K. Lee, Y. Lee, H. Jang Electrochemical Society
5 Conference Proceedings Characteristics of ZrO2/Al2O3 Bilayer Film for Gate Dielectric Applications Deposited by Atomic Layer Deposition Method Kim, Y.D., Lee, J.H., Koo, J.H, Chang, H.J., Jeon, H.T. Trans Tech Publications	11 Conference Proceedings Crystallization and Wet Etching Characteristics of Atomic Layer Deposited HfO₂ Films Using Hf[N(CH₃)(C₂H₅)]₃[OC(CH₃)₃]) Precursor and O₃ Oxidant M. Seo, S. Kim, K. Kim, T. Park, J. Kim, C. Hwang, H. Cho Electrochemical Society
6 Conference Proceedings Atomic layer deposition of Ti/N on Si(100) and (111) substrates Jeon, Hyeongtag, Koo, Jae-Hyoung, Lee, June-Woo, Kim, Young-Seok, Kang, K. M., Kim, Yang Do, Kim, Young Do MRS-Materials Research Society	12 Conference Proceedings Production of High Density Plasma on the Substrate in a Helicon Source and application to the Deposition of SiOF Film with Low Dielectric Constant Kim, J-H., Seo, S-H., Yun, S-M., Chang, H-Y., Choi, C-K., Lee, K-M. Electrochemical Society

1

2

3

4

5

6

7

8

9

10

11

12