Applications of image diagnostics to metrology quality assurance and process control
- Author(s):
Allgair, J.A. ( Motorola, Inc. (USA) ) Boksha, V.V. ( Boksha Global Partners LP (USA) ) Bunday, B.D. ( International SEMATECH (USA) ) Diebold, A.C. ( International SEMATECH (USA) ) Cole, D.C. ( Boston Univ. (USA) ) Davidson, M.P. ( Spectel Research Corp. (USA) ) Hutcheson, J.D. ( VLSI Research, Inc. (USA) ) Gurnell, A.W. ( M2C Services (United Kingdom) ) Joy, D.C. ( Univ. of Tennessee/Knoxville (USA) ) McIntosh, J.M. Muckenhirn, S.G. Pellegrini, J.C. ( New Vision Systems (USA) ) Larrabee, R.D. ( National Institute of Standards and Technology (USA) ) Potzick, J.E. Vlada, A.E. Smith, N.P. ( Accent Optical Technologies (United Kingdom) ) Starikov, A. ( Intel Corp. (USA) ) Sulivan, N.T. ( Schlumberger Technologies, Inc. (USA) ) Wells, O.C. ( IBM Corp. (USA) ) - Publication title:
- Design and process integration for microelectronic manufacturing II : 26-28 February 2003, Santa Clara, California, USA
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5042
- Pub. Year:
- 2003
- Page(from):
- 251
- Page(to):
- 277
- Pages:
- 27
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448477 [0819448478]
- Language:
- English
- Call no.:
- P63600/5042
- Type:
- Conference Proceedings
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