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13 results

Conference Proceedings

1. OPC aware mask and wafer metrology

Maurer, W. ; Wiaux, V. ; Jonckheere, R.M. ; Philipsen, V. ; Hoffmann, T. ; Verhaegen, S. ; Ronse, K.G. ; England, J.G. ; Howard, W.B.

Pub. info.:	18th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.175-181, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4764

Conference Proceedings

2. Advanced optical imaging platform for CD metrology and defect review on 130-nm to 100-nm node reticles: and overview of preliminary results

Hourd, A.C. ; Grimshaw, A. ; Scheuring, G. ; Gittinger, C. ; Brueck, H.-J. ; Chen, S.-B. ; Chen, P.W. ; Hartmann, H. ; Ordynskyy, V. ; Jonckheere, R.M. ; Philipsen, V. ; Schaetz, T. ; Sommer, K.

Pub. info.:	18th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.168-174, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4764

Conference Proceedings

3. Printability of hard and soft defects in 193-nm lithography

Philipsen, V. ; Jonckheere, R.M. ; Kohlpoth S. ; Friedrich, C.M. ; Torres, J.A.

Pub. info.:	18th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.95-111, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4764

Conference Proceedings

4. Implementation of 248-nm based CD metrology for advanced reticle production

Hourd, A.C. ; Grimshaw, A. ; Scheuring, G. ; Gittinger, C. ; Doebereiner, S. ; Hillmann, F. ; Brueck, H.-J. ; Hartmann, H. ; Ordynskyy, V. ; Peter, K. ; Chen, S.-B. ; Chen, P.W. ; Jonckheere, R.M. ; Philipsen, V. ; Schaetz, T. ; Sommer, K.

Pub. info.:	19th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.148-157, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5148

Conference Proceedings

5. Printability study for phase-shift masks at 193-nm lithography

Philipsen, V. ; Jonckheere, R.M.

Pub. info.:	19th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.79-89, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5148

Conference Proceedings

6. Through-pellicle-capable DUV-based CD metrology on reticles for wafer fab and R&D environment

Jonckheere, R.M. ; Philipsen, V. ; Scheuring, G. ; Hillmann, F. ; Brueck, H.-J. ; Ordynskyy, V. ; Peter, K. ; Hourd, A.C. ; Schaetz, T. ; Chen, S.-B. ; Chen, P.W. ; Sommer, K.

Pub. info.:	19th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.158-168, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5148

Conference Proceedings

7. Feature proximity errors on mask: assessment results of commercially obtained reticles

Jonckheere, R.M. ; Potoms, G. ; Philipsen, V.

Pub. info.:	19th European Conference on Mask Technology for Integrated Circuits and Microcomponents. pp.128-137, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5148

Conference Proceedings

8. Reliable subnanometer repeatability for CD metrology in a reticle production environment

Hourd, A.C. ; Grimshaw, A. ; Scheuring, G. ; Gittinger, C. ; Doebereiner, S. ; Hillmann, F. ; Brueck, H.-J. ; Chen, S.-B. ; Chen, P.W. ; Jonckheere, R.M. ; Philipsen, V. ; Hartmann, M. ; Ordynskyy, V. ; Peter, K. ; Schaetz,T. ; Sommer, K.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part One pp.319-327, 2002. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

Conference Proceedings

9. Extended defect printability study for 100-nm design rule using 193-nm lithography

Philipsen, V. ; Jonckheere, R.M.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part One pp.509-519, 2002. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

10.

Conference Proceedings

10. 2002 update on the SEMI Standards Mask Qualification Terminology Task Force (Invited Paper)

Jonckheere, R.M.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part One pp.336-342, 2002. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

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