Jang, W.Y. ; Lee, S.H. ; Jee, K. K. ; Jeong, S.H. ; Kim, K.S. ; Lee, E.G.
Pub. info.:
Shape memory materials and its applications : proceedings of the International Conference on Shape Memory and Superelastic Technologies and Shape Memory Materials (SMST-SMM 2001), held in Kunming, China, September 2 to 6 2001. pp.391-394, 2002. Zurich, Switzerland. Trans Tech Publications
Third International Symposium on Laser Precision Microfabrication : proceedings : 27-31 May, 2002, Osaka, Japan. pp.105-109, 2003. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Nano- and Microtechnology: Materials, Processes, Packaging, and Systems. pp.285-292, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Photomask and Next-Generation Lithography Mask Technology IX. pp.341-349, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Photomask and Next-Generation Lithography Mask Technology IX. pp.332-340, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Photomask and Next-Generation Lithography Mask Technology IX. pp.303-311, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Cho, J.S. ; Baek, S.H. ; Nam, K.H. ; Cho, H.J. ; Courboin, D. ; Jeong, S.H. ; Lee, I.S. ; Shin, C. ; Kim, H.S.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology IX. pp.205-216, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Jeong, W.-G. ; Kim, D.-W. ; Park, C.-M. ; An, K.-W. ; Lee, D.-H. ; Kim, J.-M. ; Choi, S.-S. ; Jeong, S.H.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology IX. pp.597-605, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering