Line edge roughness characterization of sub-50nm structures using CD-SAXS: round-robin benchmark results
- Author(s):
C. Wang ( National Institute of Standards and Technology (USA) ) R. L. Jones ( National Institute of Standards and Technology (USA) ) E. K. Lin ( National Institute of Standards and Technology (USA) ) W. Wu ( National Institute of Standards and Technology (USA) ) J. S. Villarrubia ( National Institute of Standards and Technology (USA) ) K. Choi ( National Institute of Standards and Technology (USA) ) J. S. Clarke ( Intel Corp. (USA) ) B. J. Rice ( Intel Corp. (USA) ) M. Leeson ( Intel Corp. (USA) ) J. Roberts ( Intel Corp. (USA) ) R. Bristol ( Intel Corp. (USA) ) B. Bunday ( International SEMATECH Manufacturing Initiative (USA) ) - Publication title:
- Metrology, inspection, and process control for microlithography XXI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6518
- Pub. Year:
- 2007
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466372 [0819466379]
- Language:
- English
- Call no.:
- P63600/6518
- Type:
- Conference Proceedings
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