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A comprehensive look at a new metrology technique to support the needs of lithography performance in near future

Author(s):
  • J. Hu ( Taiwan Semiconductor Manufacturing Co. Ltd., Taiwan )
  • C.-M. Ke ( Taiwan Semiconductor Manufacturing Co. Ltd., Taiwan )
  • W. Wang ( Taiwan Semiconductor Manufacturing Co. Ltd., Taiwan )
  • J. Huang ( Taiwan Semiconductor Manufacturing Co. Ltd., Taiwan )
  • H. L. Chung ( Taiwan Semiconductor Manufacturing Co. Ltd., Taiwan )
Publication title:
Lithography Asia 2008
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
7140
Pub. Year:
2008
Vol.:
1
Page(from):
71400N-1
Page(to):
71400N-6
Pages:
6
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819473813 [0819473812]
Language:
English
Call no.:
P63600/7140
Type:
Conference Proceedings

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