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Novel methodology of employing scatterometry to assess optical proximity correction test pattern

Author(s):
Asano, M. ( Semiconductor Co., Toshiba Corp. (Japan) )
Koike, T. ( Semiconductor Co., Toshiba Corp. (Japan) )
Mikami, T. ( Semiconductor Co., Toshiba Corp. (Japan) )
Abe, H. ( Semiconductor Co., Toshiba Corp. (Japan) )
Ikeda, T. ( Semiconductor Co., Toshiba Corp. (Japan) )
Tanaka, S. ( Semiconductor Co., Toshiba Corp. (Japan) )
Mimotogi, S. ( Semiconductor Co., Toshiba Corp. (Japan) )
2 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XIX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5752
Pub. Year:
2005
Page(from):
9
Page(to):
18
Pages:
10
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819457325 [0819457329]
Language:
English
Call no.:
P63600/5752-1
Type:
Conference Proceedings

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