Novel methodology of employing scatterometry to assess optical proximity correction test pattern
- Author(s):
Asano, M. ( Semiconductor Co., Toshiba Corp. (Japan) ) Koike, T. ( Semiconductor Co., Toshiba Corp. (Japan) ) Mikami, T. ( Semiconductor Co., Toshiba Corp. (Japan) ) Abe, H. ( Semiconductor Co., Toshiba Corp. (Japan) ) Ikeda, T. ( Semiconductor Co., Toshiba Corp. (Japan) ) Tanaka, S. ( Semiconductor Co., Toshiba Corp. (Japan) ) Mimotogi, S. ( Semiconductor Co., Toshiba Corp. (Japan) ) - Publication title:
- Metrology, Inspection, and Process Control for Microlithography XIX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5752
- Pub. Year:
- 2005
- Page(from):
- 9
- Page(to):
- 18
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819457325 [0819457329]
- Language:
- English
- Call no.:
- P63600/5752-1
- Type:
- Conference Proceedings
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