1.

Conference Proceedings
Conference Proceedings
1. Novel methodology of employing scatterometry to assess optical proximity correction test pattern
Asano, M. ; Koike, T. ; Mikami, T. ; Abe, H. ; Ikeda, T. ; Tanaka, S. ; Mimotogi, S.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XIX.  pp.9-18,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5752
2.

Conference Proceedings
Conference Proceedings
2. A photomask defect evaluation system
Yamanaka, E. ; Kanamitsu, S. ; Hirano, T. ; Tanaka, S. ; Ikeda, T. ; Ikenaga, O. ; Kawashima, T. ; Narukawa, S. ; Kobayashi, H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.257-264,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
3.

Conference Proceedings
Conference Proceedings
3. Reticle SEM specifications required for lithography simulation [5853-36]
Kariya, M. ; Yamanaka, E. ; Tanaka, S. ; Ikeda, T. ; Yamaguchi, S. ; Itoh, M. ; Kobayashi, H. ; Kawashima, T. ; Narukawa, S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.550-555,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853