1.

Conference Proceedings
Conference Proceedings
1. Gas Phase Conditioning of Silicon Surface after Reactive Ion Etching
Hwang, D.K. ; Ruzyllo, J.
Pub. info.: Proceedings of the eleventh International Symposium on Plasma Processing.  pp.555-563,  1996.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 96-12
2.

Conference Proceedings
Conference Proceedings
2. CLEANING OF SILICON SURFACE AFTER RIE USING UV/OZONE AND HF/CH3OH
Hwang, D.K. ; Ruzyllo, J. ; Kamieniecki, E.
Pub. info.: Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.401-408,  1994.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 1994-7
3.

Conference Proceedings
Conference Proceedings
3. Conditioning of Silicon Surface After RIE Using O2 and NF3 Remote Plasma
Hwang, D.K. ; Ruzyllo, J. ; Grant, R.
Pub. info.: ULSI science and technology, 1995 : proceedings of the Fifth International Symposium on Ultra Large Scale Integration Science and Technology.  pp.230-235,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-5
4.

Conference Proceedings
Conference Proceedings
4. MONITORING OF SILICON SURFACE AFTER REACTIVE ION ETCHING
Hwang, D.K. ; Ruzyllo, J. ; Kamieniecki, E.
Pub. info.: Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing.  pp.184-193,  1995.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 95-20