1.

Conference Proceedings
Conference Proceedings
1. Study on exposure contrast of an EUV mask
Hosoya, M. ; Shoki, T. ; Kinoshita, T. ; Sakaya, N. ; Nagarekawa, O.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.1026-1034,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
2.

Conference Proceedings
Conference Proceedings
2. Process development of 6-in EUV mask with TaBN absorber
Shoki, T. ; Hosoya, M. ; Kinoshita, T. ; Kobayashi, H. ; Usui, Y. ; Ohkubo, R. ; Ishibashi, S. ; Nagarekawa, O.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.857-864,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
3.

Conference Proceedings
Conference Proceedings
3. Fabrication of programmed phase defects on EUV multilayer blanks
Kinoshita, T. ; Shoki, T. ; Kobayashi, H. ; Ohkubo, R. ; Usui, Y.-I. ; Hosoya, M. ; Sakaya, N. ; Nagarekawa, O.
Pub. info.: 23rd Annual BACUS Symposium on Photomask Technology.  pp.595-606,  2003.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5256