1.

Conference Proceedings
Conference Proceedings
1. Acid diffusion characteristics of RELACS coating for 193-nm lithography
Hong, S. ; Nishibe, T. ; Okayasu, T. ; Takahashi, K. ; Takano, Y. ; Kang, W. ; Tanaka, H.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.285-293,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
2.

Conference Proceedings
Conference Proceedings
2. Advanced RELACS (resolution enhancment of lithography by assist of chemical shrink) material for 193-nm lithography
Hong, S. ; Takano, Y. ; Kanda, T. ; Kudo, T. ; Padmanaban, M. ; Tanaka, H. ; Lee, S.-H. ; Lee, J.-H. ; Woo, S.-G.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.195-206,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039