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Acid diffusion characteristics of RELACS coating for 193-nm lithography

Author(s):
Hong, S. ( Clariant (Japan) K.K. (Japan) )
Nishibe, T. ( Clariant (Japan) K.K. (Japan) )
Okayasu, T. ( Clariant (Japan) K.K. (Japan) )
Takahashi, K. ( Clariant (Japan) K.K. (Japan) )
Takano, Y. ( Clariant (Japan) K.K. (Japan) )
Kang, W. ( Clariant (Japan) K.K. (Japan) )
Tanaka, H. ( Clariant (Japan) K.K. (Japan) )
2 more
Publication title:
Advances in Resist Technology and Processing XXI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5376
Pub. Year:
2004
Page(from):
285
Page(to):
293
Pages:
9
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819452894 [0819452890]
Language:
English
Call no.:
P63600/5376.1
Type:
Conference Proceedings

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