1.

Conference Proceedings
Conference Proceedings
1. Passivation of the 4H-SiC/SiO2 Interface with Nitric Oxide
Williams, J.R. ; Chung, G.Y. ; Tin, C.C. ; McDonald, K. ; Farmer, D. ; Chanana, R.K. ; Weller, R.A. ; Pantelides, S.T. ; Holland, O.W. ; Das, M.K. ; Feldman, L.C.
Pub. info.: Silicon carbide and related materials 2001 : ICSCRM2001, proceedings of the International Conference on Silicon Carbide and Related Materials 2001, Tsukuba, Japan, October 28-November 2, 2001.  pp.967-972,  2002.  Zuerich, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 389-393
2.

Conference Proceedings
Conference Proceedings
2. Passivation of the 4H-SiC/SiO2 Interface with Nitric Oxide
Williams, J.R. ; Chung, G.Y. ; Tin, C.C. ; McDonald, K. ; Farmer, D. ; Chanana, R.K. ; Weller, R.A. ; Pantelides, S.T. ; Holland, O.W. ; Das, M.K. ; Feldman, L.C.
Pub. info.: Silicon carbide and related materials 2001 : ICSCRM2001, proceedings of the International Conference on Silicon Carbide and Related Materials 2001, Tsukuba, Japan, October 28-November 2, 2001.  pp.967-972,  2002.  Zuerich, Switzerland.  Trans Tech Publications
Title of ser.: Materials science forum
Ser. no.: 389-393
3.

Conference Proceedings
Conference Proceedings
3. Nitrogen Passivation of the Interface States Near the Conduction Band Edge in 4H-Silicon Carbide
Williams, J.R. ; Chung, G.Y. ; Tin, C.C. ; McDonald, K. ; Farmer, D. ; Chanana, R.K. ; Weller, R.A. ; Pantelides, S.T. ; Holland, O.W. ; Das, M.K. ; Lipkin, L.A. ; Feldman, L.C.
Pub. info.: Silicon carbide--materials, processing and devices : symposium held November 27-29, 2000, Boston, Massachusetts, U.S.A..  2001.  Warrendale, Pa..  Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 640