Sofield, C.J. ; Murrell, M.P. ; Sugden, S. ; Heyns, M. ; Verhaverbecke, S. ; Welland, M.E. ; Golan, B. ; Barnes, J.
Pub. info.:
Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A.. pp.105-112, 1992. Pittsburgh, Pa.. Materials Research Society
Verhaverbeke, S. ; Alay, J. ; Mertens, P. ; Meuris, M. ; Heyns, M. ; Vandervorst, W. ; Murrell, M. ; Sofield, C.
Pub. info.:
Chemical surface preparation, passivation, and cleaning for semiconductor growth and processing : symposium held April 27-29, 1992, San Francisco, California, U.S.A.. pp.391-398, 1992. Pittsburgh, Pa.. Materials Research Society
Heylen, N. ; Grillaert, J. ; Vrancken, E ; Badenes, G. ; Rooyackers, R. ; Meuris, M. ; Heyns, M.
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Proceedings of the Second International Symposium on Chemical Mechanical Planariarization [sic] in Integrated Circuit Device Manufacturing. pp.26-36, 1998. Pennington, N. J.. Electrochemical Society
Bearda, T. ; Mertens, P.W. ; Woerlee, P.H. ; Wallinga, H. ; Sebmolke, R. ; Heyns, M.
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Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology. pp.528-539, 2002. Pennington, NJ. Electrochemical Society
Vereecke, G. ; Holsteyns, F. ; Veltens, J. ; Lux, M. ; Amauts, S. ; Kenis, K. ; Vos, R. ; Mertens, P. ; Heyns, M.
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Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium. pp.145-152, 2003. Pennington, NJ. Electrochemical Society
Xu, K. ; Vos, R. ; Vereecke, G. ; Mertens, P. ; Heyns, M. ; Vinckier, C. ; Fransaer, J.
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Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium. pp.137-144, 2003. Pennington, NJ. Electrochemical Society
Vos, R. ; Meuris, M. ; Mertens, P. ; Heyns, M. ; Hatcher, Z.
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Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.569-578, 1997. Pennington, NJ. Electrochemical Society
Lander, R. ; Schram, T. ; Lulan, G.S. ; hooker, J. ; Vertommen, J. ; Lee, S. ; de Weerd, W. ; Boullart, W. ; van Elshocht, S ; Carter, R. ; Kubicek, S. ; Demeyer, K. ; De Gendt, S. ; Heyns, M.
Pub. info.:
Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium. pp.367-374, 2003. Pennington, NJ. Electrochemical Society
Vermeulen, W.J.C. ; Kwakman, L.F.Tz. ; Werkhoven, C.J. ; Granneman, E.H.A. ; Verhaverbeke, S. ; Heyns, M.
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Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.241-252, 1994. Pennington, NJ. Electrochemical Society
Zhao, C. ; Rittersma, Z. M. ; Van Berkum, J. G. M. ; Snijders, J. H. M. ; Hendriks, A. ; Breimer, P. ; Groat, P. ; Maes, J. W. ; Wittesr, H. ; Afanas'ev, V. V. ; Tois, E. ; Tuominen, M. ; Caymax, M. ; De Gendt, S. ; Heyns, M.
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Advanced gate stack, source/drain and channel engineering for Si-based CMOS, new materials, processes, and equipment : proceedings of the international symposium. pp.133-140, 2005. Pennington, NJ. Electrochemical Society
Kubicek, S. ; Van Elshocht, S. ; Delabie, A. ; Yamamoto, K. ; Beckx, S. ; Claes, M. ; Van Hoornick, N. ; Kwak, D.-H. ; Hyun, S. ; Rothschild, A. ; Veloso, A. ; Anil, K. ; Lujan, G. ; Kittle, J.A. ; Lauwers, A. ; Kaushik, V. ; Niwa, M. ; De Gendt, S. ; Heyns, M. ; Jurczak, M. ; Biesemans, S.
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ULSI Process Integration : proceedings of the International Symposium. pp.169-192, 2005. Pennington, N.J.. Electrochemical Society
Kondoh, E. ; Trauwaert, M.-A. ; Heyns, M. ; Maex, K.
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Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.221-228, 1997. Pennington, NJ. Electrochemical Society
Mertens, P. ; Baeyens, M. ; Moyaerts, G. ; Okorn-Schmidt, H. ; Vos, R. ; De Waele, R. ; Hatcher, Z. ; Hub, W. ; De Gendt, S. ; Knotter, M. ; Meuris, M. ; Heyns, M.
Pub. info.:
Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.176-183, 1997. Pennington, NJ. Electrochemical Society
Tsai, W. ; Chen, I. ; Carter, R. ; Cartier, E. ; Kluth, J. ; Richard, O. ; Claes, M. ; Lin, Y.M. ; Nohira, H. ; Conard, T. ; Caymax, M. ; Young, E. ; Vandervorst, W. ; DeGendt, S. ; Heyns, M. ; Manabe, Y. ; Maes, J.W. ; Rittersma, Z.M. ; Besling, W. ; Roozeboom, F.
Pub. info.:
Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology. pp.747-760, 2002. Pennington, NJ. Electrochemical Society
De Gendt, S. ; Beckx, S. ; Caymax, M. ; Claes, M. ; Conard, T. ; Delabie, A. ; Deweerd, W. ; Hellin, D. ; Kraus, H. ; Onsia, B. ; Parishev, V. ; Puurunen, R. ; Rohr, E. ; Snow, J. ; Tsai, W. ; Van Doome, P. ; Van Elshocht, S. ; Vertommen, J. ; Witters, T. ; Heyns, M.
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Cleaning technology in semiconductor device manufacturing VIII : proceedings of the international symposium. pp.67-77, 2003. Pennington, NJ. Electrochemical Society
Kaushik, V. ; De Gendt, S. ; Caymax, M. ; Young, E. ; Rohr, E. ; Van Elshocht, S. ; Delabie, A. ; Claes, M. ; Shi, X. ; Chen, I. ; Carter, R. ; Conard, T. ; Vandervorst, W. ; Schaekers, M. ; Heyns, M.
Pub. info.:
ULSI Process Integration : proceedings of the International Symposium. pp.391-396, 2003. Pennington, N.J.. Electrochemical Society
Hoeymissen, J. A. B. Van ; Daniels, M. ; Anderson, N. ; Fyen, W. ; Heyns, M.
Pub. info.:
Environmental, safety, and health issues in IC production : symposium held December 4-5, 1996, Boston, Massachusetts, U.S.A.. pp.55-, 1997. Pittsburgh, Pa.. MRS - Materials Research Society
McGeary, M. J. ; Martens, P. W. ; Vermeire, B. ; Heyns, M. ; Sprey, H. ; Lubbers, A. ; Schaekers, M.
Pub. info.:
Environmental, safety, and health issues in IC production : symposium held December 4-5, 1996, Boston, Massachusetts, U.S.A.. pp.115-, 1997. Pittsburgh, Pa.. MRS - Materials Research Society
Nigam, T. ; Degraeve, R. ; Groeseneken, G. ; Heyns, M. ; Maes, H. E.
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Structure and electronic properties of ultrathin dielectric films on silicon and related structures : symposium held November 29-December 1, 1999, Boston, Massachusetts, U.S.A.. pp.337-, 2000. Warrendale, PA. MRS-Materials Research Society
Conard, T. ; Witte, H. De ; Vandervorst, W. ; Houssa, M. ; Heyns, M. ; Pomarede, C. ; Werkhoven, C.
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Structure and electronic properties of ultrathin dielectric films on silicon and related structures : symposium held November 29-December 1, 1999, Boston, Massachusetts, U.S.A.. pp.69-, 2000. Warrendale, PA. MRS-Materials Research Society
Elshocht, S.Van ; Brijs, B. ; Caymax, M. ; Conard, T. ; Gendt, S.De ; Kubicek, S. ; Meuris, M. ; Onsia, B. ; Richard, O. ; Teerlinck, I. ; Steenbergen, J.Van ; Zhao, C. ; Heyns, M.
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High-mobility group-IV materials and devices : symposium held April 13-15, 2004, San Francisco, California, U.S.A.. pp.287-292, 2004. Warrendale, Pa.. Materials Research Society
Kaushik, V. S. ; DeGendt, S. ; Carter, R. ; Claes, M. ; Rohr, E. ; Pantisano, L. ; Kluth, J. ; Kerber, A. ; Cosnier, V. ; Cartier, E. ; Tsai, W. ; Young, E. ; Green, M. ; Chen, J. ; Jang, S-A. ; Lin, S. ; Delabie, A. ; Elshocht, S. V. ; Manabe, Y. ; Richard, O. ; Zhao, C. ; Bender, H. ; Caymax, M. ; Heyns, M.
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Crystalline oxide-silicon heterostructures and oxide optoelectronics : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A.. pp.145-152, 2003. Warrendale, PA. Materials Research Society
Zhao, C. ; Brijs, B. ; Dortu, F. ; DeGendt, S. ; Caymax, M. ; Heyns, M. ; Besling, W. ; Maes, J.W.
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Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah. pp.243-251, 2003. Pennington, NJ. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Zhao, C. ; DeGendt, S. ; Caymax, M. ; Heyns, M. ; Consier, V. ; Maes, J.W. ; Roebben, G. ; Van Der Biest, O.
Pub. info.:
Analytical and diagnostic techniques for semiconductor materials, devices, and processes : joint proceedings of the symposia on: ALTECH 2003, Analytical Techniques for Semiconductor Materials and Process Characterization IV, Paris, France and the 202nd Meeting of the Electrochemical Society, Diagnostic Techniques for Semiconductor Materials and Devices VI, Salt Lake City, Utah. pp.252-259, 2003. Pennington, NJ. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Kaushik, V.S. ; Gendt, S.De ; Carter, R. ; Claes, M. ; Rohr, E. ; Pantisano, L. ; Kluth, J. ; Kerber, A. ; Cosnier, V. ; Cartier, E. ; Tsai, W. ; Young, E. ; Green, M. ; Chen, J. ; Jang, S-A. ; Lin, S. ; Delabie, A. ; Elshocht, S.V. ; Manabe, Y. ; Richard, O. ; Zhao, C. ; Bender, H. ; Caymax, M. ; Heyns, M.
Pub. info.:
Novel materials and processes for advances CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A.. pp.335-342, 2003. Warrendale, Pa.. Materials Research Society
Pantisano, L. ; Afanas'ev, V. ; Ragnarsson, L-A. ; Houssa, M. ; Degraeve, R. ; Groeseneken, G. ; Schram, T. ; DeGendt, S. ; Heyns, M.
Pub. info.:
Crystalline defects and contamination: their impact and control in device manufacturing IV : DECON 2005 : proceedings of the Satellite Symposium to ESSDERC 2005, Grenoble, France. pp.144-158, 2005. Pennington, N.J.. Electrochemical Society
Devriendt, K. ; Fyen, W. ; Grillaert, J. ; Heylen, N. ; Heyns, M. ; Meuris, M. ; Vrancken, E.
Pub. info.:
Chemical mechanical polishing -- fundamentals and challenges : symposium held April 5-7, 1999, San Francisco, California, U.S.A.. pp.45-50, 2000. Warrendale, PA. Materials Research Society
Onsia, B. ; Schellkes, E. ; Vos, R. ; De Gendt, S. ; Doll, O. ; Fester, A. ; Kolbesen, B. ; Hoffman, M. ; Hatcher, Z. ; Wolke, K. ; Mertens, P. ; Heyns, M.
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Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium. pp.23-30, 2001. Pennington, N.J.. Electrochemical Society
Vankerckhoven, H. ; De Smedt, F. ; Vinckier, C. ; Van Herp, B. ; Claes, M. ; De Gendt, S. ; Heyns, M.
Pub. info.:
Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium. pp.77-84, 2001. Pennington, N.J.. Electrochemical Society
Xu, K. ; Vos, R. ; Arnauts, S. ; Lux, M. ; Schaetzlein, W. ; Speh, U. ; Mertens, P. ; Heyns, M. ; Vinckier, C.
Pub. info.:
Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium. pp.187-194, 2001. Pennington, N.J.. Electrochemical Society
Claes, M. ; Rohr, E. ; De Gendt, S. ; Lagrange, S. ; Bergman, E. ; Heyns, M.
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Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium. pp.314-321, 2001. Pennington, N.J.. Electrochemical Society
Zhao, C. ; Cosnier, V. ; Chen, P.J. ; Richard, O. ; Roebben, G. ; Maes, J. ; Elshocht, S.Van ; Bender, H. ; Young, E. ; Biest, O.Van Der ; Caymax, M. ; Vandervorst, W. ; Gendt, S.De ; Heyns, M.
Pub. info.:
Novel materials and processes for advances CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A.. pp.9-14, 2003. Warrendale, Pa.. Materials Research Society
Carter, R.J. ; Tsai, W. ; Young, E. ; Caymax, M. ; Maes, J.W. ; Chen, P.J. ; Delabie, A. ; Zhao, C. ; Gendt, S.De ; Heyns, M.
Pub. info.:
Novel materials and processes for advances CMOS : symposium held December 2-4, 2002, Boston, Massachusetts, U.S.A.. pp.35-40, 2003. Warrendale, Pa.. Materials Research Society
Bearda, T. ; Mertens, P.W. ; Woerlee, P.H. ; Wallinga, H. ; Sebmolke, R. ; Heyns, M.
Pub. info.:
Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology. pp.528-539, 2002. Pennington, NJ. Electrochemical Society
Caymax, Matty ; Bender, H. ; Brijs, B. ; Conard, T. ; Gendt, S. De ; Delabie, A. ; Heyns, M. ; Onsia, B. ; Ragnarsson, L. ; Richard, O. ; Vandervorst, W. ; Elshocht, S. Van ; Zhao, C. ; Maes, J. W. ; Date, L. ; Pique, D. ; Young, E. ; Tsai, W. ; Shimamoto, Y.
Pub. info.:
CMOS front-end materials and process technology : symposium held April 22-24, 2003, San Francisco, California, U.S.A.. pp.47-58, 2003. Warrendale, Pa.. Materials Research Society
Tsai, W. ; Chen, I. ; Carter, R. ; Cartier, E. ; Kluth, J. ; Richard, O. ; Claes, M. ; Lin, Y.M. ; Nohira, H. ; Conard, T. ; Caymax, M. ; Young, E. ; Vandervorst, W. ; DeGendt, S. ; Heyns, M. ; Manabe, Y. ; Maes, J.W. ; Rittersma, Z.M. ; Besling, W. ; Roozeboom, F.
Pub. info.:
Semiconductor silicon 2002 : proceedings of the ninth International Symposium on Silicon Materials Science and Technology. pp.747-760, 2002. Pennington, NJ. Electrochemical Society
Tsai, W. ; Ragnarrson, L.-A. ; Schram, T. ; DeGendt, S. ; Heyns, M.
Pub. info.:
Advanced short-time thermal processing for Si-based CMOS devices : proceedings of the international symposium. pp.321-327, 2004. Pennington, NJ. Electrochemical Society
Fyen, W. ; Holsteyns, F. ; Lauerhaas, J. ; Bearda, T. ; Mertens, P. ; Heyns, M.
Pub. info.:
Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium. pp.91-101, 2001. Pennington, N.J.. Electrochemical Society
Lauerhaas, J. ; Wu, Y. ; Xu, K. ; Vereecke, G. ; Vos, R. ; Kenis, K. ; Mertens, P. ; Nicolosi, T. ; Heyns, M.
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Cleaning technology semiconductor device manufacturing : proceedings of the seventh international symposium. pp.147-155, 2001. Pennington, N.J.. Electrochemical Society
De Witte, H. ; Passefort, S. ; Besling, W. ; Maes, J.W.H. ; Eason, K. ; Youngand, E. ; Heyns, M.
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Rapid thermal and other short-time processing technologies III : proceedings of the international symposium. pp.153-162, 2002. Pennington, NJ. Electrochemical Society
Elshocht, S.Van ; Brijs, B. ; Caymax, M. ; Conard, T. ; Gendt, S.De ; Kubicek, S. ; Meuris, M. ; Onsia, B. ; Richard, O. ; Teerlinck, I. ; Steenbergen, J.Van ; Zhao, C. ; Heyns, M.
Pub. info.:
Integration of advanced micro- and nanoelectronic devices - critical issues and solutions : symposium held April 13-16, 2004, San Francisco, California, U.S.A.. pp.163-168, 2004. Warrendale, Pa.. Materials Research Society
Loo, R. ; Delhougne, R. ; Meunier-Beillard, P. ; Caymax, M. ; Verheyen, P. ; Eneman, G. ; Wolf, I.De ; Janssens, T. ; Benedetti, A. ; Meyer, K.De ; Vandervorst, W. ; Heyns, M.
Pub. info.:
High-mobility group-IV materials and devices : symposium held April 13-15, 2004, San Francisco, California, U.S.A.. pp.3-14, 2004. Warrendale, Pa.. Materials Research Society
Verhaverbeke, S. ; Meuris, M. ; Schmidt, H. ; Mertens, P. ; Heyns, M.
Pub. info.:
Proceedings of the Third International Symposium on Cleaning Technology in Semiconductor Device Manufacturing. pp.176-185, 1994. Pennington, NJ. Electrochemical Society
Nigam, T. ; Depas, M. ; Heyns, M. ; Sofield, C. J. ; Mapeldoram, L.
Pub. info.:
Materials reliability in microelectronics VII : symposium held April 8-12, 1997, San Francisco, California, U.S.A.. pp.101-, 1997. Pittsburgh, Pa.. MRS - Materials Research Society