1.

Conference Proceedings
Conference Proceedings
1. Development of automatic OPC treatment and layout decomposition for double dipole lithography for low-k1 imaging
Chiou, T.-B. ; Chen, A. C. ; Hsu, S. D. ; Eurlings, M. ; Hendrickx, E.
Pub. info.: Advanced microlithography technologies : 8-10 November, 2004, Beijing, China.  pp.21-31,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5645
2.

Conference Proceedings
Conference Proceedings
2. Photorefractive Polymers and Polymer-Dispersed Liquid Crystals
Kippelen, B. ; Golemme, A. ; Hendrickx, E. ; Wang, J. F. ; Marder, S. R. ; Peyghambarian, N.
Pub. info.: Field responsive polymers : electroresponsive, photoresponsive, and responsive polymers in chemistry and biology.  pp.204-,  1999.  Washington, D.C..  American Chemical Society
Title of ser.: ACS symposium series
Ser. no.: 726
3.

Conference Proceedings
Conference Proceedings
3. Photorefractive Polymers With High Speed
Peyghambarian, N. ; Ferrio, K. B. ; Herlocker, J. A. ; Hendrickx, E. ; Guenther, B. D. ; Mery, S. ; Zhang, Y. ; Kippelen, B.
Pub. info.: Organic nonlinear optical materials and devices : symposium held April 6-9, 1999, San Francisco, California, U.S.A..  pp.131-,  1999.  Warrendale, PA.  MRS - Materials Research Society
Title of ser.: Materials Research Society symposium proceedings
Ser. no.: 561
4.

Conference Proceedings
Conference Proceedings
4. Progress in 193nm immersion lithography at IMEC
Ronse, K. ; Vandenberghe, G. ; Hendrickx, E. ; Leunissen, L. H. A. ; Aksenov, Y.
Pub. info.: EMLC 2005 : 21st European Mask and Lithography Conference : 31 January-3 February, 2005, Dresden, Germany.  pp.6-12,  2005.  Bellingham, Wash.,.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5835
5.

Conference Proceedings
Conference Proceedings
5. Optical extensions integration for a 0.314-μm2 45-nm node 6-transistor SRAM cell
Verhaegen, S. ; Nackaerts, A. ; Wiaux, V. ; Hendrickx, E. ; Vandenberghe, G.
Pub. info.: Design and process integration for microelectronic manufacturing III : 3-4 March 2005, San Jose, California, USA.  pp.120-130,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5756
6.

Conference Proceedings
Conference Proceedings
6. Experimental and Theoretical Investigation of the Second-Order Optical Properties of the Chromophore Retinal and Its Derivatives: Modeling the Bacteriorhodopsin Binding Pocket
Hendrickx, E. ; Dehu, C. ; Clays, K. ; Bredas, J. L. ; Persoons, A.
Pub. info.: Polymers for second-order nonlinear optics.  pp.82-,  1995.  Washington, D.C..  American Chemical Society
Title of ser.: ACS symposium series
Ser. no.: 601
7.

Conference Proceedings
Conference Proceedings
7. Comparative study of bi-layer attenuating phase-shifting masks for hyper-NA lithography [6283-123]
Yoshizawa, M. ; Philipsen, V. ; Leunissen, A. H. L. ; Hendrickx, E. ; Jonckheere, R. ; Vandenberghe, G. ; Buttgereit, U. ; Becker, H. ; Koepernik, C. ; Irmscher, M.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XIII.  pp.62831G-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6283
8.

Conference Proceedings
Conference Proceedings
8. Early learning on hyper-NA lithography using two-beam immersion interference [6154-70]
Hendrickx, E. ; Op de Beeck, M. ; Gronheid, R. ; Versluijs, J. ; Van Look, L. ; Ercken, M. ; Vandenberghe, G.
Pub. info.: Optical Microlithography XIX.  pp.61541X-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6154
9.

Conference Proceedings
Conference Proceedings
9. Pattern displacement induced by lens aberrations
Hendrickx, E. ; Vandenberghe, G. ; Ronse, K.G. ; Colina, A. ; van der Hoff, A. ; Dusa, M.V. ; Finders, J.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1155-1162,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
10.

Conference Proceedings
Conference Proceedings
10. Optical extensions towards the 45-nm node
Hendrickx, E. ; Monnoyer, P. ; Van Look, L. ; Vandenberghe, G.
Pub. info.: Optical Microlithography XVII.  pp.357-368,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
11.

Conference Proceedings
Conference Proceedings
11. Implementation of pattern-specific illumination pupil optimization on Step & Scan systems
Engelen, A. ; Socha, R.J. ; Hendrickx, E. ; Scheepers, W. ; Nowak, F. ; Van Dam, M. ; Liebchen, A. ; Faas, D.A.
Pub. info.: Optical Microlithography XVII.  pp.1323-1333,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
12.

Conference Proceedings
Conference Proceedings
12. Experimental verification of a model-based decomposition method for double dipole lithography
Eurlings, M. ; Hsu, S.D. ; Hendrickx, E. ; op 't Root, W. ; Laidig, T.L. ; Chiou, T.-B. ; Chen, A. ; Chen, F. ; Vandenberghe, G. ; Finders, J.
Pub. info.: Optical Microlithography XVII.  pp.1225-1236,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
13.

Conference Proceedings
Conference Proceedings
13. Double dipole lithography for 65-nm node and beyond: a technology readiness review
Hsu, S.D. ; Eurlings, M. ; Hendrickx, E. ; Van Den Broeke, D.J. ; Chiou, T.-B. ; Chen, J.F. ; Laidig, T.L. ; Shi, X. ; Finders, J.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.481-498,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
14.

Conference Proceedings
Conference Proceedings
14. Application challenges with double patterning technology (DPT) beyond 45 nm [6349-75]
Park, J. ; Hsu, S. ; Van Den Broeke, D. ; Chen, J. F. ; Dusa, M. ; Socha, R. ; Finders, J. ; Vleeming, B. ; van Oosten, A. ; Nikolsky, P. ; Wiaux, V. ; Hendrickx, E. ; Bekaert, J. ; Vandenberghe, G.
Pub. info.: Photomask Technology 2006.  pp.634922-634922,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
15.

Conference Proceedings
Conference Proceedings
15. Progress in organic photorefractive material development
Kippelen, B. ; Herlocker, J. ; Maldonado, J.L. ; Ferrio, K. ; Hendrickx, E. ; Mery, S. ; Golemme, A. ; Marder, S.R. ; Peyghambarian, N.
Pub. info.: Xerographic Photoreceptors and Organic Photorefractive Materials IV.  pp.22-28,  1998.  Bellingham, Wash..  SPIE
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3471