Hsu, S.D. ; Eurlings, M. ; Hendrickx, E. ; Van Den Broeke, D.J. ; Chiou, T.-B. ; Chen, J.F. ; Laidig, T.L. ; Shi, X. ; Finders, J.
Pub. info.:
Photomask and Next-Generation Lithography Mask Technology XI. pp.481-498, 2004. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering