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R-mask: a new concept and its application for small-volume production

Author(s):
Hayano, K. ( Hitachi, Ltd. (Japan) )
Hotta, S. ( Hitachi, Ltd. (Japan) )
Hasegawa, N. ( Hitachi, Ltd. (Japan) )
Hosono, K. ( Renesas Technology Corp. (Japan) )
Tanaka, T. ( Renesas Technology Corp. (Japan) )
Suko, K. ( Renesas Technology Corp. (Japan) )
Sasaki, S. ( Dai Nippon Printing Co., Ltd. (Japan) )
Mohri, H. ( Dai Nippon Printing Co., Ltd. (Japan) )
Hoga, M. ( Dai Nippon Printing Co., Ltd. (Japan) )
Hayashi, N. ( Dai Nippon Printing Co., Ltd. (Japan) )
5 more
Publication title:
24th Annual BACUS Symposium on Photomask Technology
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
5567
Pub. Year:
2004
Page(from):
257
Page(to):
268
Pages:
12
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819455130 [081945513X]
Language:
English
Call no.:
P63600/5567-1
Type:
Conference Proceedings

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