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Auxiliary pattern generation to cancel unexpected images at sidelobe overlap regions in attenuated phase-shift masks

Author(s):
Nakajo, K. ( Hitachi ULSI Systems Co., Ltd. (Japan) )
Sakemi, J. ( Hitachi ULSI Systems Co., Ltd. (Japan) )
Fukuda, H. ( Hitachi, Ltd. (Japan) )
Terasawa, T. ( Hitachi, Ltd. (Japan) )
Hasegawa, N. ( Hitachi, Ltd. (Japan) )
Tsujimoto, E. ( Hitachi, Ltd. (Japan) )
1 more
Publication title:
Photomask and X-Ray Mask Technology VI
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
3748
Pub. Year:
1999
Page(from):
214
Page(to):
221
Pages:
8
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819432308 [081943230X]
Language:
English
Call no.:
P63600/3748
Type:
Conference Proceedings

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