1.

Conference Proceedings
Conference Proceedings
1. Practical DUV lithography for the optoelectronics market
Harris, P.D. ; McCallum, M. ; Muir, D. ; Hughes, G. ; Pinkney, S.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVII.  2  pp.910-917,  2003.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5038
2.

Conference Proceedings
Conference Proceedings
2. Effect of aberrations on defect printing and inspection
Harris, P.D. ; McCallum, M.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1480-1491,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
3.

Conference Proceedings
Conference Proceedings
3. A 90-nm design-rule patterning application using alt-PSM with KrF lithography for volume manufacturing at k1=0.27
Majoni, S. ; Driessen, F.A. ; Kasprowicz, B.S. ; Harris, P.D.
Pub. info.: Optical Microlithography XVII.  pp.1342-1349,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377