Methacrylate resists and antireflective coatings for 193-nm lithography
- Author(s):
Taylor, G. N. ( Shipley Co. Inc. ) Trefonas, P. ( Shipley Co. Inc. ) Szmanda, C. R. ( Shipley Co. Inc. ) Barclay, G. G. ( Shipley Co. Inc. ) Kavanagh, R. J. ( Shipley Co. Inc. ) Blacksmith, R. F. ( Shipley Co. Inc. ) Joesten, L. A. ( Shipley Co. Inc. ) Monaghan, M. J. ( Shipley Co. Inc. ) Coley, S. ( Shipley Co. Inc. ) Mao, Z. ( Shipley Co. Inc. ) Cameron, J. F. ( Shipley Co. Inc. ) Hardy, R. ( Shipley Co. Inc. ) Gronbeck, D. ( Shipley Co. Inc. ) Connolly, S. ( Shipley Co. Inc. ) - Publication title:
- Microlithography 1999 : advances in resist technology and processing XVI : 15-17 March 1999, Santa Clara, California
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3678
- Pub. Year:
- 1999
- Page(from):
- 174
- Page(to):
- 185
- Pages:
- 12
- Pub. info.:
- Bellingham, Wash., USA: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819431523 [0819431524]
- Language:
- English
- Call no.:
- P63600/3678-1
- Type:
- Conference Proceedings
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