1.

Conference Proceedings
Conference Proceedings
1. Study of Over-polishing at the Edge of a Pattern in Selective CMP
Park, J.-H. ; Park, D.-W. ; Lee, J.-D. ; Hong, C. ; Han, W.-S. ; Moon., J.-T.
Pub. info.: Chemical Mechanical Planarization : proceedings of the International Symposium.  pp.283-289,  2003.  Pennington, NJ.  Electrochemical Society
Title of ser.: Electrochemical Society Proceedings Series
Ser. no.: 2003-21
2.

Conference Proceedings
Conference Proceedings
2. A novel focus monitoring method using double side chrome mask
Cha, B.-C. ; Kim, Y.-H. ; Yoon, H.-S. ; Han, W.-S.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.303-314,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
3.

Conference Proceedings
Conference Proceedings
3. Advanced module-based approach to effective CD prediction of sub-100nm patterns
Shin, J. ; Kim, I. ; Hwang, C. ; Park, D.-W. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA.  pp.65-73,  2004.  Bellingham, Wash., USA.  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5378
4.

Conference Proceedings
Conference Proceedings
4. Layer-specific illumination optimization by Monte Carlo method
Kim, H.-C. ; Nam, D.-S. ; Hwang, C. ; Kang, Y.S. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Optical Microlithography XVI.  Part One  pp.244-250,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
5.

Conference Proceedings
Conference Proceedings
5. Implementing chemically amplified resist to 10kV raster e-beam process in photomask manufacturing [5853-19]
Kim, S.-K. ; Kim, B.-G. ; Moon, S.-Y. ; Choi, S.-W. ; Han, W.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.425-431,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
6.

Conference Proceedings
Conference Proceedings
6. Simulation of resist heating effect with e-beam lithography using distributed processing (DP) [5853-18]
Ki, W.-T. ; Ahn, B.-S. ; Park, J.-S. ; Choi, S.-W. ; Ma, S.-B. ; Han, W.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.416-424,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
7.

Conference Proceedings
Conference Proceedings
7. Monitoring system of CD error analysis for the 90-nm node mask manufacturing [5853-11]
Yu, S.-Y. ; Kim, S.-H. ; Cha, B.-C. ; Kim, Y.-H. ; Choi, S.-W. ; Yoon, H.-S. ; Han, W.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.83-89,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
8.

Conference Proceedings
Conference Proceedings
8. The application of phase grating to CLM technology for the sub-65nm node optical lithography [5853-55]
Yoon, G.-S. ; Kim, S.-H. ; Park, J.-S. ; Choi, S.-Y. ; Jean, C.-U. ; Shin, I.-K. ; Choi, S.-W. ; Han, W.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.703-713,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
9.

Conference Proceedings
Conference Proceedings
9. Evaluations of optical performance for micro-trench on quartz etch in ArF lithography [5853-67]
Ahn, W.-S. ; Kwon, H.-J. ; Moon, S.-Y. ; Choi, S.-W. ; Han, W.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.818-826,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
10.

Conference Proceedings
Conference Proceedings
10. Load balancing using DP management server for commercial MDP software [6349-146]
Kim, J.-W. ; Ki, W.-T. ; Jang, S.-H. ; Choi, J.-H. ; Choi, S.-W. ; Han, W.-S.
Pub. info.: Photomask Technology 2006.  pp.63493X-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
11.

Conference Proceedings
Conference Proceedings
11. Evaluation of ArF CLM in the sub-100-nm DRAM cell
Lee, J.-H. ; Chung, D.-H. ; Kim, H.-C. ; Nam, D.-S. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Optical Microlithography XVI.  Part One  pp.251-260,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
12.

Conference Proceedings
Conference Proceedings
12. Flare-induced CD variation correction using transmittance controlled mask
Nam, D.-S. ; Yeo, G.-S. ; Park, J.R. ; Choi, S.-W. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Optical Microlithography XVI.  Part One  pp.561-569,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
13.

Conference Proceedings
Conference Proceedings
13. Efffectiveness and confirmation of local area flare measurement method in various pattern layouts
Nam, D. ; Lee, E. ; Jung, S.-G. ; Kang, Y. ; Yeo, G.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Optical Microlithography XV.  Part One  pp.57-66,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
14.

Conference Proceedings
Conference Proceedings
14. ArF issues of 90-nm-node DRAM device integration
Goo, D.-H. ; Kim, B.-S. ; Park, J.-S. ; Yoon, K.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Optical Microlithography XVI.  Part Three  pp.1296-1303,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
15.

Conference Proceedings
Conference Proceedings
15. Challenge for effective OCV control in 90-nm logic gate using ArF lithography
Kang, H.-J. ; Lee, S.-W. ; Lee, D.-Y. ; Yeo, G.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Optical Microlithography XVI.  Part Two  pp.1194-1201,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
16.

Conference Proceedings
Conference Proceedings
16. Process latitude extension in low k1 DRAM lithography using specific layer-oriented illumination design
Kang, Y.S. ; Nam, D.-S. ; Hwang, C. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Optical Microlithography XVI.  Part Three  pp.1304-1309,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5040
17.

Conference Proceedings
Conference Proceedings
17. Extension of Cr-less PSM to sub 90-nm-node DRAM and logic device
Lee, J.-H. ; Kim, H.-D. ; Chung, D.-H. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology X.  pp.727-735,  2003.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5130
18.

Conference Proceedings
Conference Proceedings
18. Validation of ArF chromeless PSM in the sub-100-nm node DRAM cell
Lee, J.-H. ; Chung, D.-H. ; Cha, D.-C. ; Kim, H.-S. ; Park, J.-S. ; Nam, D.-G. ; Woo, S.-K. ; Cho, H.-S. ; Han, W.-S.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part Two  pp.1253-1262,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
19.

Conference Proceedings
Conference Proceedings
19. Automated CD SEM tilt-ready for primetime: a fast in-line methodology for differentiating lines vs. spaces
Choi, Y.-H. ; Sung, M.-K. ; Lee, S.-H. ; Lee, J.-H. ; Park, J.-H. ; Choi, I.-H. ; Moon, S.-Y. ; Choi, S.-W. ; Han, W.-S.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XIX.  pp.351-362,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5752
20.

Conference Proceedings
Conference Proceedings
20. Comprehensive approach to determining the specification for mask mean to target
Lee, S.-W. ; Kim, I.S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: 22nd Annual BACUS Symposium on Photomask Technology.  Part One  pp.209-220,  2002.  Bellingham, WA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4889
21.

Conference Proceedings
Conference Proceedings
21. Lithography technology trend for DRAM devices (Invited Paper)
Han, W.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology IX.  pp.15-25,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4754
22.

Conference Proceedings
Conference Proceedings
22. Fluorocarbon-based single-layer resist for 157-nm lithography
Song, K.Y. ; Yoon, K.-S. ; Choi, S.-J. ; Woo, S.-G. ; Han, W.-S. ; Lee, J.-J. ; Lee, S.-K. ; Noh, C.-H. ; Honda, K.
Pub. info.: Advances in Resist Technology and Processing XIX.  Part One  pp.504-511,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4690
23.

Conference Proceedings
Conference Proceedings
23. Measurement of the flare and in-field linewidth variation due to the flare
Jeong, T.M. ; Choi, S.-W. ; Woo, S.-G. ; Han, W.-S. ; Sohn, J.-M.
Pub. info.: Optical Microlithography XV.  Part Two  pp.1465-1473,  2002.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4691
24.

Conference Proceedings
Conference Proceedings
24. Assessments on process parameters' influences to the proximity correction
Lee, E.-M. ; Lee, S.-W. ; Lee, D.-Y. ; Choi, S.-H. ; Park, J.-O. ; Jung, S.-G. ; Yeo, G.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.287-295,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
25.

Conference Proceedings
Conference Proceedings
25. New approach for quartz dry etching using hardmask for sub-90-nm photomask technology
Huh, S. ; Yoon, K.-S. ; Jang, I.-Y. ; Hwang, J.-H. ; Shin, I.-K. ; Choi, S.-W. ; Han, W.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.19-27,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
26.

Conference Proceedings
Conference Proceedings
26. Analysis of dose modulation method for fogging effect correction at 50-KeV e-beam system
Jang, S.-H. ; Yang, S.-H. ; Ahn, B.-S. ; Ki, W.-T. ; Choi, J.-H. ; Choi, S.-W. ; Han, W.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.669-674,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
27.

Conference Proceedings
Conference Proceedings
27. Way for LEEPL technology to succeed in memory device application
Kim, I.-S. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Emerging Lithographic Technologies VIII.  pp.1060-1067,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5374
28.

Conference Proceedings
Conference Proceedings
28. Successful application of angular scatterometry to process control in sub-100-nm DRAM device
Kim, J.- ; Kim, S.-J. ; Chin, S.-B. ; Oh, S.-H. ; Goo, D.-H. ; Lee, S.-J. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T. ; Raymond, C.J. ; Littau, M.E. ; Youn, B.J. ; Sohn, C.-J.
Pub. info.: Metrology, Inspection, and Process Control for Microlithography XVIII.  pp.541-549,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5375
29.

Conference Proceedings
Conference Proceedings
29. Analysis of mask CD error by dose modulation for fogging effect
Lee, H. ; Yang, S.-H. ; Kim, B.-G. ; Moon, S.-Y. ; Choi, S.-W. ; Yoon, H.-S. ; Han, W.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XI.  pp.143-147,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5446
30.

Conference Proceedings
Conference Proceedings
30. Image simulation in immersion lithography using Debye integral and scattering matrix method
Kim, S.-S. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Optical Microlithography XVII.  pp.393-404,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
31.

Conference Proceedings
Conference Proceedings
31. Evaluation of puddle time effect and optimization of development process in 193-nm lithography
Lee, H.-R. ; Shin, J. ; Kim, H.-W. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.1115-1122,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
32.

Conference Proceedings
Conference Proceedings
32. Realization of sub-80-nm small-space patterning in ArF photolithography
Kim, S.-H. ; Kim, H.-D. ; Lee, S.-H. ; Park, C.-M. ; Ryoo, M.-H. ; Yeo, G.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.1082-1090,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
33.

Conference Proceedings
Conference Proceedings
33. Performance of a SSQ-type ArF bilayer resist in 80-nm node DRAM line and space fabrication
Jung, M.-H. ; Kim, H.-W. ; Hong, J. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.1100-1106,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
34.

Conference Proceedings
Conference Proceedings
34. Layer-specific illumination for low-k1 periodic and semiperiodic DRAM cell patterns: design procedure and application
Hwang, C. ; Nam, D.-S. ; Park, J.-H. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Optical Microlithography XVII.  pp.947-952,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
35.

Conference Proceedings
Conference Proceedings
35. Investigation of stray light characteristic by multiple Gaussian modeling and its OPC application
Kim, H. ; Nam, D. ; Yeo, G.-S. ; Lee, S.-J. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Optical Microlithography XVII.  pp.459-462,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
36.

Conference Proceedings
Conference Proceedings
36. Fulfillment of model-based OPC for contact patterns in 60-nm level logic device
Kim, S.-W. ; Lee, S.-W. ; Park, C.-M. ; Choi, S.-H. ; Lee, Y.-M. ; Kang, Y. ; Yeo, G.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Optical Microlithography XVII.  pp.1157-1164,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
37.

Conference Proceedings
Conference Proceedings
37. Study of Cr patch validity for ArF CPL mask and its fabrication
Kim, C.-H. ; Kim, S.-H. ; Lee, M.-S. ; Park, J.-S. ; Shin, I.-G. ; Choi, S.-W. ; Yoon, H.-S. ; Han, W.-S.
Pub. info.: Optical Microlithography XVII.  pp.1247-1254,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
38.

Conference Proceedings
Conference Proceedings
38. Impact of illumination intensity profile on lithography simulation
Hwang, C. ; Kim, I. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Optical Microlithography XVII.  pp.1427-1434,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
39.

Conference Proceedings
Conference Proceedings
39. Modified procedure for evaluation of low-k1 process windows
Park, D.-W. ; Lee, S. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Optical Microlithography XVII.  pp.1422-1426,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5377
40.

Conference Proceedings
Conference Proceedings
40. Strategy for sub-80-nm contact hole patterning considering device fabrication
Yoon, J.-Y. ; Hata, M. ; Hah, J.-H. ; Kim, H.-W. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.196-204,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
41.

Conference Proceedings
Conference Proceedings
41. Comprehensive analysis of sources of total CD variation in ArF resist perspective
Kim, H.-W. ; Lee, H.-R. ; Kim, K.-M. ; Lee, S.Y. ; Kim, B.-C. ; Oh, S.-H. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.254-265,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
42.

Conference Proceedings
Conference Proceedings
42. Effect of line-edge roughness (LER) and line-width roughness (LWR) on sub-100-nm device performance
Lee, J.-Y. ; Shin, J. ; Kim, H.-W. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.426-433,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376
43.

Conference Proceedings
Conference Proceedings
43. The study of optical performance for quartz dry etching quality in ArF lithography [6349-12]
Ahn, W.-S. ; Lee, H.-K. ; Park, Y.-J. ; Kwon, H.-J. ; Choi, S.-W. ; Han, W.-S.
Pub. info.: Photomask Technology 2006.  pp.63490C-,  2006.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6349
44.

Conference Proceedings
Conference Proceedings
44. Process monitoring system for instant defect detection and analysis in 65 nm node photomask fabrications [5853-34]
Cho, Y.-S. ; Park, J.-H. ; Cho, W.-I. ; Kim, Y.-H. ; Choi, S.-W. ; Han, W.-S.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology XII.  pp.533-538,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5853
45.

Conference Proceedings
Conference Proceedings
45. Improvement of pattern collapse in sub-100 nm nodes
Jung, M.-H. ; Lee, S.-H. ; Kim, H.-W. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.1298-1303,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
46.

Conference Proceedings
Conference Proceedings
46. Adaptability and validity of thin organic bottom anti-reflective coating (BARC) to sub-90-nm patterning in ArF lithography
Kim, S.-H. ; Lee, S.-H. ; Yeo, G.-S. ; Lee, J.H. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.940-947,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
47.

Conference Proceedings
Conference Proceedings
47. What an antishrinkage coating method can surmount among stumbling block of ArF resists
Kim, H.-D. ; Lee, S.-H. ; Choi, S.-J. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.827-837,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
48.

Conference Proceedings
Conference Proceedings
48. Most feasible curing process for ArF resists in device integration aspect
Kim, H.-W. ; Kang, Y. ; Lee, J.-H. ; Chae, Y.-S. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Advances in Resist Technology and Processing XX.  2  pp.817-826,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039
49.

Conference Proceedings
Conference Proceedings
49. Comparison of ArF bilayer resists for sub-90 nm L/S fabrication
Hong, J. ; Kim, H.-W. ; Lee, S.-H. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.
Pub. info.: Advances in Resist Technology and Processing XX.  1  pp.249-256,  2003.  Bellingham, CA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5039