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30 results

Conference Proceedings

1. Advanced module-based approach to effective CD prediction of sub-100nm patterns

Shin, J. ; Kim, I. ; Hwang, C. ; Park, D.-W. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.

Pub. info.:	Data analysis and modeling for process control : 26-27 February 2004, Santa Clara, California, USA. pp.65-73, 2004. Bellingham, Wash., USA. SPIE - The International Society of Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5378

Conference Proceedings

2. Layer-specific illumination optimization by Monte Carlo method

Kim, H.-C. ; Nam, D.-S. ; Hwang, C. ; Kang, Y.S. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Optical Microlithography XVI. Part One pp.244-250, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

3. Evaluation of ArF CLM in the sub-100-nm DRAM cell

Lee, J.-H. ; Chung, D.-H. ; Kim, H.-C. ; Nam, D.-S. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Optical Microlithography XVI. Part One pp.251-260, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

4. Flare-induced CD variation correction using transmittance controlled mask

Nam, D.-S. ; Yeo, G.-S. ; Park, J.R. ; Choi, S.-W. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Optical Microlithography XVI. Part One pp.561-569, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

5. Efffectiveness and confirmation of local area flare measurement method in various pattern layouts

Nam, D. ; Lee, E. ; Jung, S.-G. ; Kang, Y. ; Yeo, G.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.

Pub. info.:	Optical Microlithography XV. Part One pp.57-66, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4691

Conference Proceedings

6. ArF issues of 90-nm-node DRAM device integration

Goo, D.-H. ; Kim, B.-S. ; Park, J.-S. ; Yoon, K.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.

Pub. info.:	Optical Microlithography XVI. Part Three pp.1296-1303, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

7. Challenge for effective OCV control in 90-nm logic gate using ArF lithography

Kang, H.-J. ; Lee, S.-W. ; Lee, D.-Y. ; Yeo, G.-S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S. ; Moon, J.-T.

Pub. info.:	Optical Microlithography XVI. Part Two pp.1194-1201, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

8. Process latitude extension in low k1 DRAM lithography using specific layer-oriented illumination design

Kang, Y.S. ; Nam, D.-S. ; Hwang, C. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Optical Microlithography XVI. Part Three pp.1304-1309, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5040

Conference Proceedings

9. Extension of Cr-less PSM to sub 90-nm-node DRAM and logic device

Lee, J.-H. ; Kim, H.-D. ; Chung, D.-H. ; Woo, S.-G. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	Photomask and Next-Generation Lithography Mask Technology X. pp.727-735, 2003. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	5130

10.

Conference Proceedings

10. Comprehensive approach to determining the specification for mask mean to target

Lee, S.-W. ; Kim, I.S. ; Lee, J.-H. ; Cho, H.-K. ; Han, W.-S.

Pub. info.:	22nd Annual BACUS Symposium on Photomask Technology. Part One pp.209-220, 2002. Bellingham, WA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4889

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