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Exploring the limitations of x-ray reflectivity as a critical dimension pattern shape metrology

Author(s):
  • H.-J. Lee ( National Institute of Standards and Technology, USA )
  • S. Kim ( National Institute of Standards and Technology, USA )
  • C. L. Soles ( National Institute of Standards and Technology, USA )
  • E. K. Lin ( National Institute of Standards and Technology, USA )
  • W. Wu ( National Institute of Standards and Technology, USA )
Publication title:
Metrology, inspection, and process control for microlithography XXII
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6922
Pub. Year:
2008
Vol.:
2
Page(from):
692224-1
Page(to):
692224-8
Pages:
8
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819471079 [0819471070]
Language:
English
Call no.:
P63600/6922
Type:
Conference Proceedings

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