1.

Conference Proceedings
Conference Proceedings
1. EUVL contamination control studies for high-volume manufacturing
D. N. Ruzic ; R. Raju ; J. Sporre ; H. Shin ; W. M. Lytle
Pub. info.: Lithography Asia 2008.  1  pp.714006-1-714006-12,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 7140
2.

Conference Proceedings
Conference Proceedings
2. Plasma cleaning of nanoparticles from EUV mask materials by electrostatics
W. M. Lytle ; R. Raju ; H. Shin ; C. Das ; M. J. Neumann
Pub. info.: Metrology, inspection, and process control for microlithography XXII.  1  pp.69220D-1-69220D-9,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6922
3.

Conference Proceedings
Conference Proceedings
3. Plasma Sn cleaning integrated in EUV source system
H. Shin ; R. Raju ; D. N. Ruzic
Pub. info.: Emerging lithographic technologies XII.  2  pp.692132-1-692132-8,  2008.  Bellingham, Wash..  Society of Photo-optical Instrumentation Engineers
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 6921