Performance of a 1.35NA ArF immersion lithography system for 40-nm applications
- Author(s):
J. de Klerk ( ASML Netherlands B.V. (Netherlands) ) C. Wagner ( ASML Netherlands B.V. (Netherlands) ) R. Droste ( ASML Netherlands B.V. (Netherlands) ) L. Levasier ( ASML Netherlands B.V. (Netherlands) ) L. Jorritsma ( ASML Netherlands B.V. (Netherlands) ) E. van Setten ( ASML Netherlands B.V. (Netherlands) ) H. Kattouw ( ASML Netherlands B.V. (Netherlands) ) J. Jacobs ( ASML Netherlands B.V. (Netherlands) ) T. Heil ( Carl Zeiss SMT AG (Germany) ) - Publication title:
- Optical microlithography XX
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6520
- Pub. Year:
- 2007
- Pub. info.:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819466396 [0819466395]
- Language:
- English
- Call no.:
- P63600/6520
- Type:
- Conference Proceedings
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