Theoretical And Experimental Analysis Of The Low Dielectric Constant Of Fluorinated Silica

Theoretical And Experimental Analysis Of The Low Dielectric Constant Of Fluorinated Silica

Author(s):

Demkov, A.A.

Publication title:

Materials, technology and reliability for advanced interconnects and low-k dielectrics : symposium held April 23-27, 2000, San Francisco, California, U.S.A.

Title of ser.:

Materials Research Society symposium proceedings

Ser. no.:

612

Pub. Year:

2001

Page(from):

D3.8

Pub. info.:

Warrendale, PA: Materials Research Society

ISSN:

02729172

ISBN:

9781558995208 [155899520X]

Language:

English

Call no.:

M23500/612

Type:

Conference Proceedings

Details

TDL ID:	ZA00014200
Series ID:	PA00000011
Conf. info. (Name):	Symposium on materials, technology and reliability for advanced interconnects and low-k dielectrics
Conf. info. (Number):	2000
Conf. info. (Venue):	San Francisco, CA, USA
Conf. info. (Date):	2000.04.23-2000.04.27

Similar Items:

1 Conference Proceedings Theoretical and Experimental Analysis of the Low Dielectric Constant of Fluorinated Silica Angyal, M., baugh, Ash., D, M., Demkov, A., Filipiak, S., Gregory, R. B., Kottke, M., Liu, R., Mclntyre, L. C., Werho, … Materials Research Society	7 Conference Proceedings Processable Fluorinated Acrylic Resins with Low Dielectric Constants Hu, Henry S.-W., Griffith, James R. American Chemical Society
2 Conference Proceedings Reaction Between Low-Dielectric-Constant Fluorinated Polyimide and Aluminum Tong, H. Y., Szalkowski, F. J., Shi, F. G., Zhao, B., Brongo, M., Wang, S-Q., Vasudev, P. K. MRS - Materials Research Society	8 Conference Proceedings Remote Microwave Plasma Enhanced CVD of Low Dielectric Constant SiOxFy Films From FASi-4 and Oxygen Virmani, M., Jin, Z., Leusink, G.J., Raupp, G.B., Cale, T.S., Laxman, R.K., Hochberg, A.K. Electrochemical Society
3 Conference Proceedings Theoretical and experimental investigation of ultrathin oxynitrides Demkov, A. A., Liu, R. MRS-Materials Research Society	9 Conference Proceedings Investigations of the Low Dielectric Constant Fluorinated Polyimide for Use as the Interlayer Dielectric in ULSI Lee, Y. K., Murarka, S. P., Jeng, S. -P., Auman, B. MRS - Materials Research Society
4 Conference Proceedings Spectroscopic Ellipsometry as a Potential In-Line Optical Metrology Tool For Relative Porosity Measurements of Low- K Dielectric Films Edwards, N.V., Vella, J., Xie, Q., Zollner, S., Werho, D., Adhihetty, I., Liu, R., Tiwald, T.E., Russell, C., Vires, J., … Materials Research Society	10 Conference Proceedings (4.18) 8:16 - 8:19 PM - Enhancement of SiGe Relaxation for Fabrication of SGOI Substrates Using Condensation Sadaka, M., Thean, A., Barr, A., White, T., Vartanian, V., Zavala, M., Nguyen, B-Y., Xie, Q., Liu, R., Wang, X-D., … Electrochemical Society
5 Conference Proceedings Fluorinated Heteroaromatic Polyethers for Low Dielectric Constant/High Temperature Applications Maier, G., Schneider, J. M., Hecht, R. MRS - Materials Research Society	11 Conference Proceedings Materials Issues in the Integration of F-doped TEOS for ULSI Applications Boeck, B.A., Angyal, M.S., Filipiak, S.M., Rogers, B. Electrochemical Society
6 Conference Proceedings Integration of Multi-Level Copper Metallization into a High-Performance Sub-0.25 ｦﾌm Technology Venkatraman, R., Jain, A., Farkas, J., Mendonca, J., Hamilton, G., Capasso, C., Denning, D., Simpson, C., Rogers, B., … MRS - Materials Research Society	12 Conference Proceedings Dielectric function of AlN grown on Si(111) by MBE Zollner, S., Konkar, A., Gregory, R. B., Wilson, S. R., Nikishin, S. A., Temkin, H. MRS-Materials Research Society

1

2

3

4

5

6

7

8

9

10

11

12