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Evaluation of damage induced by electron-beam irradiation to MOS gate pattern and method for damage-free inspection [6152-66]

Author(s):
Matsui, M. ( Hitachi, Ltd. (Japan) )
Machida, S. ( Hitachi, Ltd. (Japan) )
Mine, T. ( Hitachi, Ltd. (Japan) )
Hozawa, K. ( Hitachi, Ltd. (Japan) )
Watanabe, K. ( Hitachi, Ltd. (Japan) )
Goto, Y. ( Hitachi, Ltd. (Japan) )
Inoue, J. ( Renesas Technology Corp. (Japan) )
Nagaishi, H. ( Renesas Technology Corp. (Japan) )
3 more
Publication title:
Metrology, Inspection, and Process Control for Microlithography XX
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6152
Pub. Year:
2006
Pt.:
1
Page(from):
61521S
Pub. info.:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461957 [0819461954]
Language:
English
Call no.:
P63600/6152
Type:
Conference Proceedings

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