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Mask data volume: historical perspective and future requirements [6281-21]

Author(s):
Spense, C.
Goad, S. ( Advenced Micro Devices, Inc. (USA) )
Buck, P.
Gladhill, R.
Cinque, R. ( Toppan Photomasks, Inc. (Germany) )
Preuninger, J.
Griesinger, U ( IFX (Germany) )
Blocker, M. ( AMTC (Germany) )
3 more
Publication title:
EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6281
Pub. Year:
2006
Page(from):
62810H
Pub. info.:
Bellingham, Wash.,: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819463562 [0819463566]
Language:
English
Call no.:
P63600/6281
Type:
Conference Proceedings

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