Mask data volume: historical perspective and future requirements [6281-21]
- Author(s):
Spense, C. Goad, S. ( Advenced Micro Devices, Inc. (USA) ) Buck, P. Gladhill, R. Cinque, R. ( Toppan Photomasks, Inc. (Germany) ) Preuninger, J. Griesinger, U ( IFX (Germany) ) Blocker, M. ( AMTC (Germany) ) - Publication title:
- EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 6281
- Pub. Year:
- 2006
- Page(from):
- 62810H
- Pub. info.:
- Bellingham, Wash.,: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819463562 [0819463566]
- Language:
- English
- Call no.:
- P63600/6281
- Type:
- Conference Proceedings
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