Toward a comprehensive control of full-field image quality in optical photolithography
- Author(s):
Flagello,D.G. ( ASM Lithography BV ) Klerk,J.de Davies,G. Rogoff,R. Geh,B. Arnz,M. Wegmann,U. Kraemer,M. - Publication title:
- Optical Microlithography X
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 3051
- Pub. Year:
- 1997
- Page(from):
- 672
- Page(to):
- 685
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819424655 [081942465X]
- Language:
- English
- Call no.:
- P63600/3051
- Type:
- Conference Proceedings
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