AIMS-45 image validation of contact hole patterns affer inverse lithography at NA 1.35
- Author(s):
- E. Hendrickx ( IMEC, Belgium )
- R. Birkner ( Mentor Graphics Corp., United States )
- M. Kempsell ( Carl Zeiss SMS, Germany )
- A. Tritchkov ( Carl Zeiss SMS, Germany )
- G. Vandenberghe ( IMEC, Belgium )
- Publication title:
- Photomask technology 2008
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 7122
- Pub. Year:
- 2008
- Vol.:
- 1
- Page(from):
- 71221E-1
- Page(to):
- 71221E-11
- Pages:
- 11
- Pub. info.:
- Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
- ISSN:
- 0277786X
- ISBN:
- 9780819473554 [0819473553]
- Language:
- English
- Call no.:
- P63600/7122
- Type:
- Conference Proceedings
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