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The study of phase-angle and transmission specifications of 6% att-EAPSM for 90nm, 6Snm, and 45nm node wafer manufacturing patterning process

Author(s):
  • G. Chen ( Freescale Semiconductor, Inc., USA )
  • C. Garza ( Freescale Semiconductor, Inc., USA )
Publication title:
Photomask technology 2007
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:
6730
Pub. Year:
2007
Vol.:
2
Page(from):
67302R-1
Page(to):
67302R-7
Pages:
7
Pub. info.:
Bellingham, Wash.: Society of Photo-optical Instrumentation Engineers
ISSN:
0277786X
ISBN:
9780819468871 [0819468878]
Language:
English
Call no.:
P63600/6730
Type:
Conference Proceedings

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