1.

Conference Proceedings
Conference Proceedings
1. Improvement of beam-adjustment accuracy by beam-intensity distribution measurement of a second shaping aperture in electron-beam writing systems
Nagata,K. ; Okumura,M. ; Maio,K. ; Fujii,A. ; Andoh,H. ; Morimura,T. ; Hayakawa,H.
Pub. info.: Emerging lithographic technologies V : 27 February-1 March, 2001, Santa Clara, [California], USA.  pp.692-703,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4343
2.

Conference Proceedings
Conference Proceedings
2. Technologies for electron-beam reticle writing systems for 130-nm node and below
Matsuoka,G. ; Saton,H. ; Fujii,A. ; Mizuno,K. ; Nakahara,T. ; Asai,S. ; Kadowaki,Y. ; Shimada,H. ; Touda,H. ; Iizumi,K. ; Takahashi,H. ; Oonuki,K. ; Kawahara,T. ; Kawasaki,K. ; Nagata,K.
Pub. info.: 21st Annual BACUS Symposium on Photomask Technology.  4562  pp.45-55,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4562
3.

Conference Proceedings
Conference Proceedings
3. Advanced e-beam reticle writing system for next-generation reticle fabrication
Fujii,A. ; Mizuno,K. ; Nakahara,T. ; Asai,S. ; Kadowaki,Y. ; Shimada,H. ; Touda,H. ; Iizumi,K. ; Takahashi,H. ; Oonuki,K. ; Kawahara,T. ; Kawasaki,K. ; Nagata,K. ; Satoh,H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VIII.  pp.258-269,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4409