Paulsson, A. ; Xing, K. ; Fosshaug, H. ; Lundvall, A. ; Bjornberg, C. ; Karlsson, J.
Pub. info.:
Advances in resist technology and processing XXII : 28 February-2 March, 2005, San Jose, California, USA. pp.527-536, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA. pp.1601-1628, 2005. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Hellgren, J. ; Fosshaug, H. ; osterberg, A. ; Ivansen, L.
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Photomask and Next-Generation Lithography Mask Technology XIII. pp.62831I-, 2006. Bellingham, Wash.. SPIE - The International Society of Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering
Rosling, M. ; Karawajczyk, A. ; Askebjer, P. ; Zerne, R. ; Carroll, A.M. ; Eklund, R. ; Fosshaug, H. ; Sandstrom, T.
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22nd Annual BACUS Symposium on Photomask Technology. Part Two pp.759-766, 2002. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:
Proceedings of SPIE - the International Society for Optical Engineering