1.

Conference Proceedings
Conference Proceedings
1. Some aspects on mechanisms responsible for contamination of optical components in DUV lithographic exposure tools
Fosshaug, H. ; Ekberg, M. ; Kylberg, G.
Pub. info.: Optical microlithography XVIII : 1-4 March, 2005, San Jose, California, USA.  pp.1601-1628,  2005.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5754
2.

Conference Proceedings
Conference Proceedings
2. Influence of writing strategy on CD control for the spatial-light-modulator-based Sigma7300 DUV laser pattern generator
Fosshaug, H. ; Askebjer, P. ; Karlsson, J. ; Bajramovic, A. ; Xing, K. ; Eklund, R. ; Walford, J. ; Ekberg, M. ; Hogfeldt, P. ; ystrym, T.
Pub. info.: Advances in Resist Technology and Processing XXI.  pp.879-894,  2004.  Bellingham, Wash..  SPIE - The International Society of Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 5376