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11 results

Conference Proceedings

1. 0.11-μm imaging in KrF lithography using dipole illumination

Eurlings,M. ; Setten,E.van ; Torres,J.A. ; Dusa,M.V. ; Socha,R.J. ; Capodieci,L. ; Finders,J.

Pub. info.:	Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK. pp.266-278, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4404

Conference Proceedings

2. Mask error factor:causes and implications for process latitude

Schoot,J.van ; Finders,J. ; Schenau,K.van Ingen ; Klaassen,M. ; Buijk,C.

Pub. info.:	Optical microlithography XII : 17-19 March 1999, Santa Clara, California. Part1 pp.250-260, 1999. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3679

Conference Proceedings

3. KrF lithography for 130 nm

Finders,J. ; Schoot,J.B.van ; Vanoppen,P. ; Dusa,M.V. ; Socha,R.J. ; Vandenberghe,G. ; Ronse,K.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part1 pp.192-205, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

4. CD control comparison of step-and-repeat versus step-and-scan DUV lithography for sub-0.25-ｦﾌm gate printing

Ronse,K. ; Maenhoudt,M. ; Marschner,T. ; Van,den,hove,L. ; Streefkerk,B. ; Finders,J. ; van,Schoot,J. ; Luehrmann,P.F. ; Minvielle,A.M.

Pub. info.:	Optical microlithography XI : 25-27 February 1998, Santa Clara, California. pp.56-66, 1998. Bellingham, Wash., USA. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3334

Conference Proceedings

5. Forbidden pitches for 130-nm lithography and below

Socha,R.J. ; Dusa,M.V. ; Capodieci,L. ; Finders,J. ; Chen,J.F. ; Flagello,D.G. ; Cummings,K.D.

Pub. info.:	Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA. Part2 pp.1140-1155, 2000. Bellingham, Wash., USA. SPIE - The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4000

Conference Proceedings

6. Low-k1 imaging: how low can we go?

Finders,J. ; Eurlings,M. ; Schenau,K.Van Ingen ; Dusa,M.V. ; Jenkins,P.

Pub. info.:	Microlithographic Techniques in Integrated Circuit Fabrication II. pp.1-15, 2000. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4226

Conference Proceedings

7. NA/o optimization strategies for an advanced DUV stepper applied to 0.25-ｦﾌm and sub-0.25-ｦﾌm critical levels

Beeck,M.Op de ; Ronse,K. ; Ghandehari,K. ; Jaenen,P. ; Botermans,H. ; Finders,J. ; Lilygren,J.A. ; Baker,D.C. ; Vandenberghe,G. ; Bisschop,P.De ; Maenhoudt,M. ; hove,L.Van den

Pub. info.:	Optical Microlithography X. pp.320-332, 1997. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	3051

Conference Proceedings

8. Printing 130-nm DRAM isolation pattern: Zernike correlation and tool improvement

Schoot,J.B.van ; Seong,N. ; Geh,B. ; Burkhardt,M. ; Graupner,P. ; Reisinger,G. ; Rubingh,R. ; Suddendorf,M. ; Finders,J. ; Rikkers,E.

Pub. info.:	Optical Microlithography XIV. 4346 pp.229-240, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

Conference Proceedings

9. ArF step-and-scan system with 0.75 NA for the 0.10-μm node

Vleeming,B. ; Heskamp,B. ; Bakker,H. ; Verstappen,L. ; Finders,J. ; Stoeten,J. ; Borret,R. ; Roempp,O.

Pub. info.:	Optical Microlithography XIV. 4346 pp.634-650, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

10.

Conference Proceedings

10. Can DUV take us below 100 nm?

Finders,J. ; Jorritsma,L. ; Eurlings,M. ; Moerman,R. ; Greevenbroek,H.van ; Schoot,J.B.van ; Flagello,D.G. ; Socha,R.J. ; Stammler,T.

Pub. info.:	Optical Microlithography XIV. 4346 pp.153-165, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4346

11.

Conference Proceedings

11. Perfect photoresist for 157-nm imaging

Conley,W. ; Byers,J.D. ; Dean,K.R. ; Hansen,S.G. ; Finders,J. ; Sinkwitz,S.

Pub. info.:	Advances in Resist Technology and Processing XVIII. 4345 pp.344-349, 2001. Bellingham, Wash.. SPIE-The International Society for Optical Engineering
Title of ser.:	Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.:	4345

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