1.

Conference Proceedings
Conference Proceedings
1. KrF lithography for 130 nm
Finders,J. ; Schoot,J.B.van ; Vanoppen,P. ; Dusa,M.V. ; Socha,R.J. ; Vandenberghe,G. ; Ronse,K.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.192-205,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
2.

Conference Proceedings
Conference Proceedings
2. CD control comparison of step-and-repeat versus step-and-scan DUV lithography for sub-0.25-ｦﾌm gate printing
Ronse,K. ; Maenhoudt,M. ; Marschner,T. ; Van,den,hove,L. ; Streefkerk,B. ; Finders,J. ; van,Schoot,J. ; Luehrmann,P.F. ; Minvielle,A.M.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.56-66,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334
3.

Conference Proceedings
Conference Proceedings
3. NA/o optimization strategies for an advanced DUV stepper applied to 0.25-ｦﾌm and sub-0.25-ｦﾌm critical levels
Beeck,M.Op de ; Ronse,K. ; Ghandehari,K. ; Jaenen,P. ; Botermans,H. ; Finders,J. ; Lilygren,J.A. ; Baker,D.C. ; Vandenberghe,G. ; Bisschop,P.De ; Maenhoudt,M. ; hove,L.Van den
Pub. info.: Optical Microlithography X.  pp.320-332,  1997.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3051