Can DUV take us below 100 nm?
- Author(s):
Finders,J. ( ASML ) Jorritsma,L. Eurlings,M. Moerman,R. Greevenbroek,H.van Schoot,J.B.van Flagello,D.G. Socha,R.J. Stammler,T. - Publication title:
- Optical Microlithography XIV
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 4346
- Pub. Year:
- 2001
- Vol.:
- 4346
- Pt.:
- One of Two Parts
- Page(from):
- 153
- Page(to):
- 165
- Pages:
- 13
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819440327 [0819440329]
- Language:
- English
- Call no.:
- P63600/4346
- Type:
- Conference Proceedings
Similar Items:
SPIE - The International Society for Optical Engineering |
7
Conference Proceedings
Understanding systematic and random CD variations using predictive modeling techniques
SPIE - The International Society for Optical Engineering |
SPIE - The International Society for Optical Engineering |
8
Conference Proceedings
Dipole decomposition mask design for full-chip implementation at 100-nm technology node and beyond
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
9
Conference Proceedings
Design of 200-nm,170-nm,and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask through simulation:I
SPIE - The International Society for Optical Engineering |
4
Conference Proceedings
Extending KrF to 100-nm imaging with high-NA- and chromeless phase lithography technology
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
11
Conference Proceedings
Design of 200-nm,170-nm,and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask:?.Experimental results
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
12
Conference Proceedings
Optimization of process condition to balance MEF and OPC for alternating PSM: control of forbidden pitches
SPIE-The International Society for Optical Engineering |