1.

Conference Proceedings
Conference Proceedings
1. Progress in qualifying and quantifying the airborne base sensitivity of modern chemically amplified DUV photoresists
Kinkead,D.A. ; Ercken,M.
Pub. info.: Advances in resist technology and processing XVII : 28 February - 1 March 2000, Santa Clara, USA.  Part2  pp.750-758,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3999
2.

Conference Proceedings
Conference Proceedings
2. Matching simulation and experiment for chemically amplified resists
Mack,C.A. ; Ercken,M. ; Moelants,M.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.183-192,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
3.

Conference Proceedings
Conference Proceedings
3. Variable-threshold resist models for lithography simulation
Randall,J. ; Ronse,K. ; Marschner,T. ; Goethals,M. ; Ercken,M.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.176-182,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
4.

Conference Proceedings
Conference Proceedings
4. Front-end-of-line process development using 193-nm lithography
Pollentier,I.K. ; Ercken,M. ; Eliat,A. ; Delvaux,C. ; Jaenen,P. ; Ronse,K.
Pub. info.: Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK.  pp.56-67,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4404
5.

Conference Proceedings
Conference Proceedings
5. ArF lithography options for 100-nm technologies
Vandenberghe,G.N. ; Kim,Y.-C. ; Delvaux,C. ; Lucas,K.D. ; Choi,S.-J. ; Ercken,M. ; Ronse,K. ; Vleeming,B.
Pub. info.: Optical Microlithography XIV.  4346  pp.179-190,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
6.

Conference Proceedings
Conference Proceedings
6. 193-nm contact photoresist reflow feasibility study
Lucas,K.D. ; Slezak,M. ; Ercken,M. ; Roey,F.Van
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.725-736,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345
7.

Conference Proceedings
Conference Proceedings
7. Molecular base sensitivity studies of various DUV resists used in semiconductor fabrication
Ruede,D. ; Ercken,M. ; Borgers,T.
Pub. info.: Optical Microlithography XIV.  4346  pp.1020-1028,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346