1.

Conference Proceedings
Conference Proceedings
1. Variable-threshold resist models for lithography simulation
Randall,J. ; Ronse,K. ; Marschner,T. ; Goethals,M. ; Ercken,M.
Pub. info.: Optical microlithography XII : 17-19 March 1999, Santa Clara, California.  Part1  pp.176-182,  1999.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3679
2.

Conference Proceedings
Conference Proceedings
2. Front-end-of-line process development using 193-nm lithography
Pollentier,I.K. ; Ercken,M. ; Eliat,A. ; Delvaux,C. ; Jaenen,P. ; Ronse,K.
Pub. info.: Lithography for semiconductor manufacturing II : 30 May-1 June, 2001, Edinburgh, UK.  pp.56-67,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4404
3.

Conference Proceedings
Conference Proceedings
3. ArF lithography options for 100-nm technologies
Vandenberghe,G.N. ; Kim,Y.-C. ; Delvaux,C. ; Lucas,K.D. ; Choi,S.-J. ; Ercken,M. ; Ronse,K. ; Vleeming,B.
Pub. info.: Optical Microlithography XIV.  4346  pp.179-190,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346