1.

Conference Proceedings
Conference Proceedings
1. ArF lithography options for 100-nm technologies
Vandenberghe,G.N. ; Kim,Y.-C. ; Delvaux,C. ; Lucas,K.D. ; Choi,S.-J. ; Ercken,M. ; Ronse,K. ; Vleeming,B.
Pub. info.: Optical Microlithography XIV.  4346  pp.179-190,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
2.

Conference Proceedings
Conference Proceedings
2. 193-nm contact photoresist reflow feasibility study
Lucas,K.D. ; Slezak,M. ; Ercken,M. ; Roey,F.Van
Pub. info.: Advances in Resist Technology and Processing XVIII.  4345  pp.725-736,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4345