1.

Conference Proceedings
Conference Proceedings
1. Comparison study of mask error effects for various mask-making processes
Eom,T.-S. ; Hur,I.-B. ; Koo,Y.-M. ; Baik,K.-H. ; Choi,I.-H. ; Kim,D.Y. ; Shin,C.
Pub. info.: 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California.  Part2  pp.734-745,  1999.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3873
2.

Conference Proceedings
Conference Proceedings
2. Mask critical dimension error on optical lithography
Eom,T.-S. ; Koo,S.-S. ; Paek,S.-W. ; Kim,H.-B. ; Ahn,C.-N. ; Baik,K.-H.
Pub. info.: Photomask and Next-Generation Lithography Mask Technology VII.  pp.32-39,  2000.  Bellingham, Wash..  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4066
3.

Conference Proceedings
Conference Proceedings
3. Comparison study on mask error factor in 100-nm ArF and KrF lithography
Eom,T.-S. ; Hyun,Y.-S. ; Kim,C.-K. ; Bok,C.-K. ; Shin,K.-S.
Pub. info.: Optical Microlithography XIV.  4346  pp.869-878,  2001.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4346
4.

Conference Proceedings
Conference Proceedings
4. Potentialities of sub-100-nm optical lithography of alternating and phase-edge phase-shift mask for ArF lithography
Koo,S.-S. ; Kim,H.-B. ; Yune,H.-S. ; Hong,J.-S. ; Paek,S.-W. ; Eom,T.-S. ; Ahn,C.-N. ; Ham,Y.-M. ; Baik,K.-H. ; Lee,K.-Y. ; Kim,L.-J. ; Kim,H.-S.
Pub. info.: 20th Annual BACUS Symposium on Photomask Technology.  pp.346-358,  2000.  Bellingham, Wash..  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4186