Status 157-nm lithography development at IMEC
- Author(s):
Ronse, K.G. ( IMEC (Belgium) ) Bisschop, P.D. ( IMEC (Belgium) ) Eliat, A. ( IMEC (Belgium) ) Goethals, A.M. ( IMEC (Belgium) ) Hermans, J. ( IMEC (Belgium) ) Jonckheere, R. ( IMEC (Belgium) ) Heuvel, D.V.D. ( IMEC (Belgium) ) Roey, F.V. ( IMEC (Belgium) ) Beckx, S. ( IMEC (Belgium) ) Wouters, J.M. ( IMEC (Belgium) ) Marneffe, J.F. ( IMEC (Belgium) ) O'Neil, T. ( ASML (USA) ) Tirri, B. ( ASML (USA) ) Sewell, H. ( ASML (USA) ) - Publication title:
- Optical Microlithography XVI
- Title of ser.:
- Proceedings of SPIE - the International Society for Optical Engineering
- Ser. no.:
- 5040
- Pub. Year:
- 2003
- Vol.:
- Part One
- Page(from):
- 640
- Page(to):
- 649
- Pages:
- 10
- Pub. info.:
- Bellingham, Wash.: SPIE-The International Society for Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819448453 [0819448451]
- Language:
- English
- Call no.:
- P63600/5040
- Type:
- Conference Proceedings
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