1.

Conference Proceedings
Conference Proceedings
1. Status of ArF lithography for the 130-nm technology node
Ronse,K. ; Vandenberghe,G. ; Jaenen,P. ; Delvaux,C. ; Vangoidsenhoven,D. ; Roey,F.Van ; Pollers,I. ; Maenhoudt,M. ; Goethals,A.M. ; Pollentier,I.K. ; Vleeming,B. ; Schenau,K.van lngen ; Heskamp,B. ; Davies,G. ; Niroomand,A.
Pub. info.: Optical microlithography XIII : 1-3 March 2000, Santa Clara, USA.  Part1  pp.410-422,  2000.  Bellingham, Wash., USA.  SPIE - The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 4000
2.

Conference Proceedings
Conference Proceedings
2. Bottom-ARC optimization methodology for O.25-ｦﾌm lithography and beyond
Op,de,Beeck,M. ; Vandenberghe,G. ; Jaenen,P. ; Zhang,F.-H. ; Delvaux,C. ; Richardson,P. ; van,Puyenbroeck,I. ; Ronse,K. ; Lamb,III,J.E. ; van,der,Hilst,J.B.C. ; van,Wingerden,J.
Pub. info.: Optical microlithography XI : 25-27 February 1998, Santa Clara, California.  pp.322-336,  1998.  Bellingham, Wash., USA.  SPIE-The International Society for Optical Engineering
Title of ser.: Proceedings of SPIE - the International Society for Optical Engineering
Ser. no.: 3334